Effect of the resin viscosity on the writing properties of two-photon polymerization

Zandrini, Tommaso; Λιάρος, Νικόλαος; Lu, Yongfeng; Fourkas, John T.; Osellame, Roberto; Baldacchini, Tommaso

doi:10.1364/ome.9.002601

Cited by 52 publications

(47 citation statements)

References 62 publications

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“…The 2‐beam initiation threshold [ 32,33 ] (2‐BIT) method is a form of 2‐beam action (2‐BA) spectroscopy. [ 24,58,59 ] In 2‐BIT, two temporally interleaved, spatially overlapped pulse trains ( Figure A ) are used to expose a multiphoton photoresist.…”

Section: The 2‐beam Initiation Threshold Methodsmentioning

confidence: 99%

“…Here we present such a critical analysis for the four most mature methods for measuring the EOA in radical photoresists: the exposure‐time method, [ 28,29 ] the repetition‐rate method, [ 26,30 ] the line‐width method, [ 15,25,31 ] and the 2‐beam initiation threshold method. [ 32,33 ] We restrict our analysis to the case in which a single excitation event in a photoinitiator is sufficient to generate radicals (as opposed to a system in which sequential absorption events are required). In the situation we consider, the EOA is generally an integer corresponding to the number of photons needed for a single absorption event, although if the active state can be excited by two different absorption orders at a given wavelength, then the EOA may not be an integer.…”

Section: Introductionmentioning

confidence: 99%

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Methods for Determining the Effective Order of Absorption in Radical Multiphoton Photoresists: A Critical Analysis

Λιάρος

Fourkas

2020

Laser & Photonics Reviews

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The accurate determination of the effective order of absorption (EOA) for multiphoton absorption polymerization in radical photoresists is critical for the development and characterization of new materials with improved sensitivity and/or resolution. However, reliable measurement of the EOA is a challenging problem. The accuracy of four techniques that have been developed to address this issue is analyzed in terms of the known kinetics of the radical polymerization of polyfunctional monomers. It is demonstrated that methods that are based upon full reciprocity, i.e., the concept that the chemical response of the photoresist depends on the exposure dose, but not on the period over which this dose is delivered, only enable reliable determination of the EOA under a highly constrained set of circumstances. Methods that depend on limited reciprocity, i.e., the concept that the chemical response of the photoresist is the same when the total exposure window is constant, even if the details of the exposure within that window are varied, can enable accurate determination of the EOA over a considerably broader range of operating conditions. This prediction is verified experimentally. The analysis presented here provides guidance for future experiments and a basis for clearer interpretation of previously published results.

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Section: The 2‐beam Initiation Threshold Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Methods for Determining the Effective Order of Absorption in Radical Multiphoton Photoresists: A Critical Analysis

Λιάρος

Fourkas

2020

Laser & Photonics Reviews

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“…As the viscosity decreases the diffusion limitation is excluded in the propagation reaction then, as the viscosity decreases further, the diffusion limitation is excluded in the termination reaction [74]. In the work of T. Zandrini et al the influence of the viscosity to the formation of lines in 2PP was investigated (case study: viscosity influence) [75]. The experiment was performed in the same two monomers but just different proportions in their concentrations, resulting in viscosity ranging from more than 10 Pa•s to 15 mPa•s without affecting reactivity.…”

Section: Main Factors Influencing Photopolymerization Kinetics and Dementioning

confidence: 99%

“…Key parameters such as, photoexcitation, polymerization kinetics, and the properties of the additively manufactured materials at the nanoscale in 3D are examined, whereas, the perspectives for future research and as well as emerging applications are outlined. [8,9] and GHz [10] reported, too v 100 m/s (10 -10 000 m/s) not relevant for projection/interference lithography t 10 s -10 ms 0.1 -10 s exposure can be applied in interference lithography [11] P 0.02-70 mW more than 100 mW power can be applied in interference lithography [12] P 0.3 -47 kW peak power per pulse is more important than the average [13] E 0.1 -7 nJ lower than 0.1 nJ [14] and higher than 7 nJ [15] values can be observed D 20 pJ -650 J accumulated dose of multiple individual pulses NA 1.4 (1.35 -1.45) only tight focusing or immersion oil objectives (NA > 1.3) are considered [16]. F 1 3 J/cm 2 -21 kJ/cm 2 accumulated exposure dose per area at the sample I 1 0.2 -7 TW/cm 2 > 20 TW/cm 2 can be calculated, if assuming 100 % objective transmittance I 1 2 -150 TW/cm 3 towards considering the energy is absorbed within volume not at the surface W 2 80 pJ/cm 3 -0.3 mJ/cm 3 absorbed energy density per single pulse Acronyms, symbols, parameters, typical values 1 Introduction: state-of-the-art and rising demands…”

mentioning

confidence: 99%

Photopolymerization Mechanisms at a Spatio-temporally Ultra-confined Light

Skliutas¹,

Lebedevaite²,

Kabouraki³

et al. 2020

Preprint

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Ultrafast laser 3D lithography based on non-linear light-matter interactions, widely known as multi-photon lithography (MPL), offers unrivaled precision rapid prototyping and flexible additive manufacturing options. 3D printing equipment based on MPL are already commercially available, yet there is still no comprehensive understanding of factors determining spatial resolution, accuracy, fabrication throughput, repeatability, and standardized metrology methods for the accurate characterization of the produced 3D objects and their functionalities. The photoexcitation mechanisms, spatial-control or photo-modified volumes, and the variety of processable materials are topics actively investigated. The complexity of the research field is underlined by limited understanding and fragmented knowledge of light-excitation and material response. Research to date has only provided case-specific findings on photoexcitation, chemical modification, and material characterization of the experimental data. In this review, we aim to provide a consistent and comprehensive summary of the existing literature on photopolymerization mechanisms under highly confined spatial and temporal conditions, where, besides the excitation and cross-linking, parameters such as diffusion, temperature accumulation, and the finite amount of monomer molecules start to become of critical importance. Key parameters such as, photoexcitation, polymerization kinetics, and the properties of the additively manufactured materials at the nanoscale in 3D are examined, whereas, the perspectives for future research and as well as emerging applications are outlined.

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“…In order to promote hardness of the polymer, tris(2-hydroxyethyl)isocyanurate should be added [82]. Various modified acrylates were used in 3DLL through the years [83][84][85]. Overall, acrylate groups play an important role in polymers that will be discussed later, making acrylate chemistry one of the backbones of 3DLL.…”

Section: Common Photopolymersmentioning

confidence: 99%

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Merkininkaitė

Gailevičius

Šakirzanovas

et al. 2019

International Journal of Polymer Science

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Multiphoton 3D lithography is becoming a tool of choice in a wide variety of fields. Regenerative medicine is one of them. Its true 3D structuring capabilities beyond diffraction can be exploited to produce structures with diverse functionality. Furthermore, these objects can be produced from unique materials allowing expanded performance. Here, we review current trends in this research area. We pay particular attention to the interplay between the technology and materials used. Thus, we extensively discuss undergoing light-matter interactions and peculiarities of setups needed to induce it. Then, we continue with the most popular resins, photoinitiators, and general material functionalization, with emphasis on their potential usage in regenerative medicine. Furthermore, we provide extensive discussion of current advances in the field as well as prospects showing how the correct choice of the polymer can play a vital role in the structure’s functionality. Overall, this review highlights the interplay between the structure’s architecture and material choice when trying to achieve the maximum result in the field of regenerative medicine.

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Effect of the resin viscosity on the writing properties of two-photon polymerization

Cited by 52 publications

References 62 publications

Methods for Determining the Effective Order of Absorption in Radical Multiphoton Photoresists: A Critical Analysis

Methods for Determining the Effective Order of Absorption in Radical Multiphoton Photoresists: A Critical Analysis

Photopolymerization Mechanisms at a Spatio-temporally Ultra-confined Light

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

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