Abstract:The article presents the results of a study of thiophene oxidation in highdensity C 4 H 4 S/O 2 mixtures (ρ Thi = 0.12 and 0.15 mol/dm 3 , ρ O2 = 0.74−1.26 mol/dm 3 ), diluted with water vapor and argon (dilution level x D = 35−65% mol), at uniform heating (1 K/min) of a stainless-steel tubular reactor up to 823 K. It is established that the temperature of thiophene oxidation onset weakly depends on the nature of the diluent and the oxygen content in the reaction mixture. From the time dependences of the react… Show more
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