Effect of the electric-field distribution on the morphology of dot-array gratings fabricated by AFM-based nanolithography

Abstract

Local electric-field-induced anodic oxidation is one of the earliest and most extensively studied techniques in bias-assisted AFM nanolithography. The electric field provides the oxidation kinetics of nanoscale electrochemical reaction and controls the spacial resolution of the fabricated structures. Once electric field is formed, its distribution and intensity can be modified by changing the tip-sample voltage and separation. In this paper, the influence of the bias voltage on the three-dimensional (3D) radial electric field intensity distribution in the space between the tip and the sample, the influence of the 24 K. Hu et al.electric field strength on dot-array grating structures and the morphology distribution of the nanodot structure in the dot-array grating have been analysed deeply.Keywords: electric field intensity; nanofabrication; anodic oxidation; nanogratings; morphology distribution.Reference to this paper should be made as follows: Hu, K., Long, F. and Wang, Q. (2017) Qingkang Wang is a Supervisor of PhD and a Professor at Shanghai Jiao Tong University. He is graduated in the Department of Electron from Peking University, China and did research as a Senior Visiting Scholar at RWTH Aachen University and Karlsruhe University, Germany. In his research career, he has now been presiding over or participating in national and international level research projects. His research fields cover precision manufacturing, measuring and mechanical micromanipulation techniques, micro/nanooptical structures and its applications and so on.