Effect of the Ba+ Ion Implantation on the Composition and Electronic Properties of MoO3/Mo(111) Films

Changes in the electronic structure of the Si surface as a result of ion implantation

“…At present, the composition, structure, and properties of silicon-based films of various thicknesses obtained by various methods are well studied [11][12][13][14][15][16]. Some information has also been obtained on the change in the position of the maxima of the density of electronic states of silicon upon implantation of Ba+ and Na+ ions [17][18].…”

Determination of kinetic characteristics of molecule thermodesorption on the surface of oxidated molybdenum

“…Oxidized molybdenum emitters have the highest efficiency for operation in air atmosphere. The adsorption, thermal emission, and catalytic properties of molybdenum and its oxides have been studied in more detail in refs 3,4,5 …”

“…The adsorption, thermal emission, and catalytic properties of molybdenum and its oxides have been studied in more detail in refs. 3,4,5 In this work, to determine the kinetic characteristics of thermodesorption of C 9 H 7 N + CH 3 radical with m/z 144 in the form of ions and neutral particles during adsorption of morphine molecules on the Mo x O y surface we used the voltage modulation method (VMM). Morphine molecules were selected as an object of studying the nonstationary processes of organic compound by the VVM since their SI on the surface of oxidized tungsten was well studied under stationary conditions.…”

Fabrication and Study of the Electronic Structure of МоO3/Мо Nanofilms

“…Analysis of the X-ray spectra showed that the МоО 3 (or МоО 4 О 11 ) phase forms predominantly at Т = 160°С; and the МоО 2 phase, in the interval of Т = 300-700°С [11]. It is known [13][14][15][16][17][18][19] that lowenergy ion implantation is an effective tool for obtaining homogeneous nanofilms with stoichiometric compositions on the surfaces of materials of a different nature. In particular, using X-ray photoelectron spectroscopy, the authors of [13][14][15] studied Mo surface oxidation under bombardment with low-energy oxygen ion beams (Е 0 = 1-5 keV).…”

“…For t > 20 min, the surface composition changes slightly, and at t = 40 min, the МоО 2 , МоО х , and МоО 3 concentrations were formed at levels of ~42-45, 18-20, and 32-35 at %, respectively, and the concentration of unoxidized Mo did not exceed 5-7 at %. Recently conducted studies [16] showed that the low-energy implantation of oxygen ions into a film heated to a certain temperature (700-1100 K) made it possible to obtain molybdenum-oxide thin films with a certain composition.…”