Effect of the annealing temperature on transparency and conductivity of ZnO:Al thin films

Ayadi, Z. Ben; Mır, L. El; Djessas, K.; Alaya, S.

doi:10.1016/j.tsf.2009.02.062

Cited by 58 publications

(30 citation statements)

References 34 publications

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“…For the AZO films grown at high temperature, the agreement between the resistivities obtained by the different techniques is very good, producing values in the 10 to 1 mΩ-cm for the 150 ºC to 350 ºC samples, respectively, carrier densities over 10 20 cm -3 , and Hall mobilities between 6 and 30 cm 2 V -1 s -1 . These resistivities are at the higher end of the values often found in the literature [21,26,39]. Conversely, the resistivities obtained for annealed AZO films show significant discrepancies between the electrical and the optical measurements derived from the Drude model.…”

Section: Electrical Properties: Hall and Resistivitymentioning

confidence: 51%

“…These annealing temperatures were chosen as they cover the usual range often found in the literature for these materials. However, there is indeed a large variation in the annealing times -from 30 s to 2 hours -, atmospheres -N 2 , O 2 , forming gas, air -and the effect that such high temperature processing have in the films [15,17,[24][25][26][27][28]. X-Ray diffraction (XRD) measurements were performed on a Panalytical X'Pert Pro MRD system with a rotating stage.…”

Section: Methodsmentioning

confidence: 99%

“…X-Ray diffraction (XRD) measurements were performed on a Panalytical X'Pert Pro MRD system with a rotating stage. The grain size in the out of plane direction is calculated using the Scherrer's formula with a reference peak width of 0.12º [26]. Scanning electron microscope (SEM) images were taken with a LEO Gemini 1525 FEGSEM system.…”

Section: Methodsmentioning

confidence: 99%

“…So far, the intense research in this field has focused on studying the electrical performance and the transparency in the visible and near infrared (300-2000 nm), as the two most relevant properties for visual displays and solar energy applications. Existing literature covers the impact of the fabrication method and deposition conditions [7,14,[18][19][20][21][22][23], the post-processing of the film (such as high temperature annealing treatments) [15,17,[24][25][26][27][28] or the role of the substrate in governing the properties of the TCOs [29,30]. In respect to the latter, most works use glass or SiO 2 as substrates [19,23,24,[31][32][33][34] or, more recently, flexible, lightweight materials like PET or PEN [30].…”

Section: Introductionmentioning

confidence: 99%

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ITO and AZO films for low emissivity coatings in hybrid photovoltaic-thermal applications

et al. 2017

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Abstract:We report on the electrical and optical properties of ITO and AZO films fabricated directly on silicon substrates under several growth and annealing temperatures. We use broadband spectroscopic ellipsometry measurements (from 300 nm to 20 µm) to obtain a consistent model for the permittivity of each of the films. The results are then used to design an optimized, single layer, high transparency, high conductivity film, suitable as front transparent electrode and low thermal emissivity coating for silicon based solar cells. The best performance is found using the properties of the ITO film grown at 250 ºC, with a state of the art resistivity of 0.2 mΩ-cm and an optimized thickness of 75 nm which leads to 0.79 average absorptivity in the solar range (300-2000 nm) and 0.21 average emissivity in the thermal range (5-20 µm). The structural characterization of the films using X-Ray diffraction, and the Hall mobility and resistivity measurements of all the films are also provided, complementing and supporting the observed optical properties.

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Section: Electrical Properties: Hall and Resistivitymentioning

confidence: 51%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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ITO and AZO films for low emissivity coatings in hybrid photovoltaic-thermal applications

et al. 2017

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“…There are still many factors affecting the physical properties of ZnO thin films. These factors include ZnO sol concentration [14], substrate temperature [15], preheating temperature [16], post-annealing temperature [17], annealing atmosphere [18] and film thickness [19]. Among these factors, the influence of substrate temperature on structural and optical properties of ZnO thin films (especially undoped ZnO thin films) deposited by ultrasonic spray method was less studied.…”

Section: Introductionmentioning

confidence: 99%

Substrate Temperature Effect on Optical property of ZnO Thin Films

Rahal¹,

Benramache

Benhaoua³

2014

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Abstract. The transparent conducting ZnO thin films were deposited on glass substrate by ultrasonic spray technique. The optical, electrical and structural properties of the ZnO thin films were studied as a function of the substrate temperatures in the range of 300 to 400 °C. The as deposited film exhibit a hexagonal structure wurtzite and (101) oriented.The value of grain size G = 28 nm is measured of ZnO film at 350 °C. All the films having high transparency in the visible region, the band gap energy decreased from 3.44 to 3.29 eV with increasing the substrate temperatures from 300 to 400 °C, respectively according to the Burstein-Moss effect (blue shift of Eg). The Urbach energy decreased reaching to minimum at 350 °C; indicating to decrease of the defects. The electrical resistivity of the films at 350 °C is 50 Ω.cm. A systematic study on the influence of the substrate temperatures on the optical, electrical and structural properties of ZnO thin films deposited by ultrasonic spray has been reported.

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Structural and Optical Properties of Nitrogen‐doped Zinc Oxide Thin Films Grown on Muscovite Mica Substrates Using Sol–Gel Process

Kim

Leem

2015

Bulletin Korean Chem Soc

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Effect of the annealing temperature on transparency and conductivity of ZnO:Al thin films

Cited by 58 publications

References 34 publications

ITO and AZO films for low emissivity coatings in hybrid photovoltaic-thermal applications

ITO and AZO films for low emissivity coatings in hybrid photovoltaic-thermal applications

Substrate Temperature Effect on Optical property of ZnO Thin Films

Structural and Optical Properties of Nitrogen‐doped Zinc Oxide Thin Films Grown on Muscovite Mica Substrates Using Sol–Gel Process

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