Effect of substrate temperature and deposition rate on the morphology and optical properties of Ti films

Einollahzadeh-Samadi, Motahareh; Dariani, R.S.

doi:10.1016/j.apsusc.2013.04.146

Cited by 18 publications

(3 citation statements)

References 26 publications

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“…21 Hence, we summarize only the key points of the deposition processes here. DC magnetron sputtering of titanium metal on transparent conductive glass A detailed methodology of fabricating titanium thin film onto FTO glass substrate via DC magnetron sputtering has a) Author to whom correspondence should be addressed; electronic mail: dariani@alzahra.ac.ir been mentioned in our previous work.…”

Section: Methodsmentioning

confidence: 99%

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Einollahzadeh-Samadi

Dariani

2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inTiO2 nanotube arrays for photocatalysis: Effects of crystallinity, local order, and electronic structure J. Vac. Sci. Technol. A 33, 021202 (2015); 10.1116/1.4902350Band gap structure modification of amorphous anodic Al oxide film by Ti-alloying Appl. Phys. Lett.Research on the effect of crystal structures on W-TiO2 nanotube array photoelectrodes by theoretical and experimental methodsHighly ordered TiO 2 nanotube arrays were successfully fabricated using ammonium fluoride electrolyte by galvanostatic anodization technique. The nanotube arrays were grown perpendicular to the titanium film deposited onto conducting glass substrate. The effect of the different titanium film thicknesses on the morphology, optical, and electrical properties of TiO 2 nanotube arrays is investigated. It is found that the titanium film thickness is a crucial parameter for achieving highly ordered TiO 2 nanotube arrays. Morphological investigations on the nanotube arrays reveal that anodization of 1.5 lm thick titanium films leads to formation of pores at the upper layer of the film with nonuniform pore size distribution and poor interconnectivity. Instead, anodization of 2.5 and 2.0 lm thick titanium films with the same conditions leads to formation of highly ordered TiO 2 nanotube arrays with uniform size and sharp clear tubular structures, which are well connected to each other. The absorbance and optical band gap of the TiO 2 nanotube arrays are also inferred from the diffuse reflectance spectra.

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Section: Methodsmentioning

confidence: 99%

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Einollahzadeh-Samadi

Dariani

2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…Various techniques have been used to fabricate Ti films, such as: sputtering [1,[6][7][8][9], electron beam evaporation [3,10], pulsed filtered cathodic vacuum arc [11] and pulsed laser deposition [12]. Among these methods, sputtering is most extensively used because of prospection for controlling the sputtering conditions and obtaining a very high-purity production [9].…”

Section: Introductionmentioning

confidence: 99%

Study of the thickness effect on the dielectric functions by utilizing a wedge-shaped Ti film sample with continuously varied thickness

Zhang

Cai

et al. 2015

Appl. Phys. A

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The dielectric functions of direct-current-sputtered wedge-shaped ultrathin titanium (Ti) film on K9 glass were investigated in this paper. The wedge-shaped Ti thin film was deposited under the identical conditions with continuously varied thickness. Atomic force microscope revealed that the thin film surface was very smooth with the surface roughness of about 0.5 nm. The dielectric functions of the wedge-shaped films in the wavelength range of 300-1200 nm were obtained by a focused-beam ellipsometer with the beam size on the sample about 200 lm. Results show that e 1 , the real part of the dielectric function, is negative almost in the whole spectrum region, proving that the film at the measured area is continuous and shows metallic behavior. On the other hand, e 1 decreases with the increase in the film thickness, while e 2 , the imaginary part of the dielectric function, has the opposite variation tendency. The changing of e 1 with film thickness is due to the reduced electron-electron interactions and enhanced metallic behavior. While for e 2 , it gets larger with the increase in the film thickness, which is mainly owing to the decrease in the tensile stress in the film.

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“…Thin titanium oxide films can be prepared by various routes, but direct current magnetron (DC) reactive sputtering is one of the most promising methods, because it allows control of the deposited film stoichiometry. High density, excellent adhesion, high hardness, and good thickness uniformity in large-area thin films can be also achieved [1][2][3]. A metal target can be used and a high deposition rate is achievable as well.…”

Section: Introductionmentioning

confidence: 99%

Ultra-High and Near-Zero Refractive Indices of Magnetron Sputtered Thin-Film Metamaterials Based on Ti_xO_y

Jokanović

Čolović

Nenadović

et al. 2016

Advances in Materials Science and Engineering

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Metamaterials based on Ti O with ultra-high and near-zero refractive indices were obtained by DC magnetron sputtering. The data on refractive indices, extinction coefficients, film thickness, and band gaps, obtained by spectroscopic ellipsometry, showed very high potential of these materials as metamaterials. Phase analysis performed by XRD revealed the presence of titanium phases with lower titanium oxidation states resulting from high concentration of oxygen vacancies, which are crucial for such extraordinary jumps and drops of refractive indices. Numerous band gaps for direct and indirect electron transitions additionally confirmed unique properties of these materials.

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Effect of substrate temperature and deposition rate on the morphology and optical properties of Ti films

Cited by 18 publications

References 26 publications

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Study of the thickness effect on the dielectric functions by utilizing a wedge-shaped Ti film sample with continuously varied thickness

Ultra-High and Near-Zero Refractive Indices of Magnetron Sputtered Thin-Film Metamaterials Based on Ti_xO_y

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Effect of substrate temperature and deposition rate on the morphology and optical properties of Ti films

Cited by 18 publications

References 26 publications

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Study of the thickness effect on the dielectric functions by utilizing a wedge-shaped Ti film sample with continuously varied thickness

Ultra-High and Near-Zero Refractive Indices of Magnetron Sputtered Thin-Film Metamaterials Based on TixOy

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Ultra-High and Near-Zero Refractive Indices of Magnetron Sputtered Thin-Film Metamaterials Based on Ti_xO_y