Effect of substrate roughness and PVD deposition temperatures on hardness and wear performance of AlCrN-coated WC-Co

A Comprehensive Review of Cathodic Arc Evaporation Physical Vapour Deposition (CAE-PVD) Coatings for Enhanced Tribological Performance

“…Here, the resulting substrate profile depends on the pressure and abrasive properties of the abrasive medium [62]. Meanwhile, chemical substrate profiling is achieved by etching the substrate using appropriate etchants, such as Murakami's reagent or Caro's solution [68]. Nevertheless, the profiling method to be adopted depends on the type of substrate.…”

“…However, irrespective of the profiling method, the emphasis is laid on producing a homogenous surface profile with minimal surface flaws such as microcracks [35]. More so, care should be taken to avoid inducing additional residual stresses on the substrate, as it has a detrimental effect on the coating adhesion [68]. While microblasting techniques induce more residual stresses on the substrate than other profiling techniques, mechanical profiling is more prone to generating surface flaws on the substrate [7,70].…”

“…More so, it also increases the number of nucleation sites, facilitating the coating's growth [66]. However, an excessively rough substrate profile (up to an average roughness (R a ) >10 µm) could result in coatings with a nonuniform thickness [68]. This is usually accompanied by an increase in the R a of the coatings, which has been reported to negatively impact their tribological performance [71].…”

Effect of process parameters on the growth and wear resistance of CrAlN coating on silicon nitride surface

“…Preparing CrAlN solid lubricant coatings on the surface of Si 3 N 4 bearings can extend bearing service life (Cardoso et al , 2018; Prabakaran and Thambu, 2017). The wear resistance of the CrAlN coatings depends on the process parameters (Ling et al , 2022). Consequently, substantial care has been paid to the effect of process parameters on the properties of CrAlN coatings.…”

MWCNTs/Fe2O3:ZnO Nanocomposite Material for Chemoresistive Sensing of Hydrogen Peroxide Vapors

“…Among the various types of techniques available for the production of gas-sensitive films for sensor fabrication, the physical vapor deposition (PVD) method is a fairly common and advanced technique by which it is possible to obtain not only amorphous, polycrystalline, or single-crystalline materials but also composite gas-sensitive structures. − E-beam and magnetron DC/RF deposition methods belonging to the PVD group are relatively cheap, controllable, and common systems capable of transitioning from small-scale laboratory production to large-scale manufacturing. ,, …”