Effect of substrate bias voltage on structural and mechanical properties of pulsed DC magnetron sputtered TiN–MoSx composite coatings

Gangopadhyay, S.; Acharya, Ranadip; Chattopadhyay, A.K.; Paul, S.

doi:10.1016/j.vacuum.2009.11.010

Cited by 80 publications

(34 citation statements)

References 30 publications

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“…It is known in the reactive sputter growth of some dense materials, such as TiN, that only under signicant substrate bias leading to increased ion bombardment, the lms will have the desirable orientation and high density [6,7]. This may be also the case in ZnO RF deposition.…”

Section: X-ray Diractionmentioning

confidence: 99%

Investigation of Porous Zn Growth Mechanism during Zn Reactive Sputter Deposition

et al. 2014

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ArOZn plasma discharges created during DC reactive magnetron sputtering of a Zn target and RF reactive magnetron sputtering of a ceramic ZnO target were investigated and compared by means of the Langmuir probe measurements in order to determine the mechanism of growth of porous Zn lms during DC-mode Zn reactive sputtering. The power supplied to the magnetrons during the sputtering was kept at 125 W and the plasma was characterised as a function of oxygen content in the sputtering gas mixture, ranging from 0 to 60% for two gas pressures related to porous Zn lm deposition, namely 3 mTorr and 5 mTorr. Based on the correlation of plasma properties measurements with scanning electron microscope imaging and X-ray diraction of the lms deposited under selected conditions it was found that the growth of porous, polycrystalline Zn lms was governed by high electron density in the plasma combined with a high electron temperature and an increased energy of the ions impinging on the substrate.

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Section: X-ray Diractionmentioning

confidence: 99%

Investigation of Porous Zn Growth Mechanism during Zn Reactive Sputter Deposition

et al. 2014

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Section: Mechanical Propertiesmentioning

confidence: 99%

“…Enhanced dislocation movement in the coating may cause reduced hardness, while deformation by dislocation movement requires less energy than by grain boundary sliding. The enhancement of the coating hardness could be caused by the grain refinement effect with increasing bias voltage [48]. Chu et al [49] found that the residual stress was clearly related to the negative bias voltages, and high hardness is a result of such high residual stress.…”

Section: Mechanical Propertiesmentioning

confidence: 99%

Hydrogen Permeation, and Mechanical and Tribological Behavior, of CrNx Coatings Deposited at Various Bias Voltages on IN718 by Direct Current Reactive Sputtering

et al. 2018

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In the current work, the microstructure, hydrogen permeability, and properties of chromium nitride (CrN x ) thin films deposited on the Inconel 718 superalloy using direct current reactive sputtering are investigated. The influence of the substrate bias voltage on the crystal structure, mechanical, and tribological properties before and after hydrogen exposure was studied. It was found that increasing the substrate bias voltage leads to densification of the coating. X-ray diffraction (XRD) results reveal a change from mixed fcc-CrN + hcp-Cr 2 N to the approximately stoichiometric hcp-Cr 2 N phase with increasing substrate bias confirmed by wavelength-dispersive X-ray spectroscopy (WDS). The texture coefficients of (113), (110), and (111) planes vary significantly with increasing substrate bias voltage. The hydrogen permeability was measured by gas-phase hydrogenation. The CrN coating deposited at 60 V with mixed c-CrN and (113) textured hcp-Cr 2 N phases exhibits the lowest hydrogen absorption at 873 K. It is suggested that the crystal orientation is only one parameter influencing the permeation resistance of the CrN x coating together with the film structure, the presence of mixing phases, and the packing density of the structure. After hydrogenation, the hardness increased for all coatings, which could be related to the formation of a Cr 2 O 3 oxide film on the surface, as well as the defect formation after hydrogen loading. Tribological tests reveal that hydrogenation leads to a decrease of the friction coefficient by up to 40%. The lowest value of 0.25 ± 0.02 was reached for the CrN x coating deposited at 60 V after hydrogenation.

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“…Deposition parameters such as deposition time, substrate temperature and bias voltage are influential on the coating growth mechanism [16,[23][24][25][26][27]. Therefore, these parameters could also affect the coating defect formation.…”

Section: Introductionmentioning

confidence: 99%

Effect of chamber pressure on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings

Biswas

Purandare

Sugumaran

et al. 2018

Surface and Coatings Technology

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Effect of substrate bias voltage on structural and mechanical properties of pulsed DC magnetron sputtered TiN–MoSx composite coatings

Cited by 80 publications

References 30 publications

Investigation of Porous Zn Growth Mechanism during Zn Reactive Sputter Deposition

Investigation of Porous Zn Growth Mechanism during Zn Reactive Sputter Deposition

Hydrogen Permeation, and Mechanical and Tribological Behavior, of CrNx Coatings Deposited at Various Bias Voltages on IN718 by Direct Current Reactive Sputtering

Effect of chamber pressure on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings

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