2019
DOI: 10.1039/c9nr00619b
|View full text |Cite
|
Sign up to set email alerts
|

Effect of solvent on silicon nanoparticle formation and size: a mechanistic study

Abstract: Silicon nanoparticle size is adjusted by simply changing the reaction solvent. The role of solvent on nanoparticle formation is investigated.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 7 publications
(2 citation statements)
references
References 14 publications
0
2
0
Order By: Relevance
“…The change in particle size is possibly due to a difference in reduction potential as a function of solvent. 39 Even so, the silicon nanoparticles produced were crystalline, with a Raman shift of ∼500 cm −1 , indicating that the degree of crystallinity is not very sensitive to the solvent composition ( Fig. 3c ).…”
Section: Resultsmentioning
confidence: 94%
“…The change in particle size is possibly due to a difference in reduction potential as a function of solvent. 39 Even so, the silicon nanoparticles produced were crystalline, with a Raman shift of ∼500 cm −1 , indicating that the degree of crystallinity is not very sensitive to the solvent composition ( Fig. 3c ).…”
Section: Resultsmentioning
confidence: 94%
“…Therefore, extensive efforts have been directed to fabrication methods for nanostructured Si materials to yield suitable size, shape, pore morphology and surface chemistry for the intended applications. These methods include top-down approaches such as photolithography 7 or electrochemical etching of Si wafers 8 as well as bottom-up approaches such as solution chemistry, [9][10][11] solidstate synthesis 12 and Chemical Vapor Deposition (CVD). 13 One of the most important pSi NPs synthesis routes involves electrochemical etching of crystalline silicon wafers using hydrofluoric acid (HF)-containing electrolytes.…”
Section: Introductionmentioning
confidence: 99%