2015
DOI: 10.1016/j.cplett.2015.07.009
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Effect of Sn doping on properties of transparent ZnO thin films prepared by thermal evaporation technique

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Cited by 21 publications
(2 citation statements)
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“…ZnO thin films can be produced by several techniques like magnetron sputtering [10], reactive evaporation [11], pulsed laser deposition [12], sol gel technique [13] and spray pyrolysis [14]. Because of the advantages of low cost, simple processing, easy control of the film thickness and large range deposition temperatures, the spray ultrasonic is an extremely reliable technique for the deposition of thin films and is used in industry for large scale production.…”
Section: Introductionmentioning
confidence: 99%
“…ZnO thin films can be produced by several techniques like magnetron sputtering [10], reactive evaporation [11], pulsed laser deposition [12], sol gel technique [13] and spray pyrolysis [14]. Because of the advantages of low cost, simple processing, easy control of the film thickness and large range deposition temperatures, the spray ultrasonic is an extremely reliable technique for the deposition of thin films and is used in industry for large scale production.…”
Section: Introductionmentioning
confidence: 99%
“…However, B-doped ZnO, a semiconductor-like TCO, has higher resistivity and lower carrier concentration than does a metal-like TCO such as Ga-doped ZnO (GZO). Sn can also be used as a dopant in ZnO, where the Zn 2+ ion is replaced by the Sn 4+ ion, to increase the carrier concentration [19,20]. Compared with other TCOs, Sn-doped ZnO exhibits reduced conductivity owing to the high mean barrier height depending on disorder of grain boundary [21].…”
Section: Introductionmentioning
confidence: 99%