2015
DOI: 10.1007/s10832-015-9982-0
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Effect of sintering conditions on microstructure and dielectric properties of CaCu3Ti4O12 (CCTO) ceramics

Abstract: The influence of sintering temperature and dwell time on the microstructure formation and dielectric properties of CaCu3Ti4O12 ceramics was investigated. For sintering temperatures of 1050 and 1100 °C significant differences in the CaCu3Ti4O12 ceramic microstructure and the segregation of a CuOx-rich phase towards the grain boundary (GB) areas were observed with increasing dwell time. In addition to the formation of a semiconducting bulk and insulating grain boundary phase the segregated CuOx forms an intergra… Show more

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Cited by 44 publications
(14 citation statements)
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“…Several approaches have been used to reduce tan δ of CCTO through the application of different processing parameters, doping different elements into CCTO or combining it with another material to produce composite . One of the most interesting approaches is by fabrication of CCTO composites via incorporation of glass as additive.…”
Section: Introductionmentioning
confidence: 99%
“…Several approaches have been used to reduce tan δ of CCTO through the application of different processing parameters, doping different elements into CCTO or combining it with another material to produce composite . One of the most interesting approaches is by fabrication of CCTO composites via incorporation of glass as additive.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, the relative dielectric permittivity of Ag-migrated CCTO sintered for 2 h was almost 52 times that of the as-sintered CCTO ceramic; this Ag-migrated CCTO specimen has the highest value among the specimens. The metastable phase behavior was reported depending on sintering temperature and dwell time 29 . The relative dielectric permittivity of CCTO ceramic sintered at 1050 °C was higher than that of the CCTO ceramic sintered at 1100 °C.…”
Section: Resultsmentioning
confidence: 99%
“…There are appearances of three types of morphologies, which can be categorized as; type A: bimodal distribution of grains, type B: small and homogeneous grain sizes, type C: large and uniform grain distributions. CCTO films, sputtered at lower RF power, has shown bimodal grain distributions and this trend observed up to RF power of 75 W. This may be due to the formation of segregated CuO at the grain boundaries and leads to the nonuniform grain growth [24][25][26]. During annealing of CCTO films (grown at lower RF power) copper was diffused out of the grain boundary and the film surface became rough due to copper-oxide segregation.…”
Section: Methodsmentioning
confidence: 99%