Effect of rare-earth elements on the plasma etching behavior of the RE–Si–Al–O glasses

Effect of CaF2 on fluorocarbon plasma resistance and thermal properties of CaO-Al2O3-SiO2 glasses

“…In previous the plasma-resistant glasses (PRG) studies [5][6][7][8][9], they confirmed that the resistance to plasma etching improves as the metal fluoride contains more oxides of high boiling point (T b ). In addition, it has been reported that glass is uniformly etched due to the amorphous structure, thus inhibiting the occurrence of particle contamination.…”

“…That is, in CAS glass, it is effective to replace CaO with CaF 2 in order to enhance the durability of plasma gas, but it could be confirmed that there is a limit that improves beyond a certain amount. Glass containing metal oxides capable of forming fluorine compounds with high T b during CF 4 plasma etching was found to have high plasma resistance [5][6][7][8]. Table 3 shows the T b of a fluorine compound for the reference materials and glass composition elements [12].…”

“…In addition, it has been reported that glass is uniformly etched due to the amorphous structure, thus inhibiting the occurrence of particle contamination. Lee et al [5] studied R 2 O 3 -SiO 2 -Al 2 O 3 (R: Gd, La, Y) glasses and reported that as they are exposed to plasma, the addition of rare-earth element oxides to form a fluorine compound with a high T b on the glass surface contributes to a low etching rate.…”

Deposition behavior of glass thick film formation on substrates with different hardness by aerosol deposition

“…Glass coating layers are used widely across many fields, such as the semiconductor and display industries, using high-density plasma and biomaterials for dental implants and bones. The thickness of the coating layer ranges from 2 μm to 250 μm depending on the application [1][2][3][4][5][6]. On the other hand, the coating process has been limited to certain substrates due to mismatch of the thermal expansion coefficients between the substrates and materials.…”

mCharacteristics of Carbon Tetrafluoride Plasma Resistance of Various Glasses

“…Lee et al have attempted development of materials which not only have permeability but also excellent plasma resistant characteristics by using glasses containing rare earth elements as a material to substitute for quartz or sapphire employed for the window glass in plasma equipment. 13) Although plasma resistant characteristics were affirmed for the rare earth-containing glasses, there existed problems of having disadvantages such as expensive raw material prices of rare earth and high manufacturing temperature of 1700 o C required.…”