Abstract:A series of amorphous carbon nitride (a-CN x) thin films were deposited on silicon (111) substrates using a home-built radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The a-CN x thin films were deposited from a mixture of a fixed flow-rate of ethane (C 2 H 6 , 20 sccm) and nitrogen (N 2 , 47 sccm) gases with varying RF power. A higher ratio of C to H (C to H ratio is 1:3) atoms in C 2 H 6 as compared to the ratio in methane (CH 4) gas (C to H ratio is 1:4) is expected to produce an… Show more
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