Effect of precursors on propagation loss for plasma-enhanced chemical vapor deposition of SiN_x:H waveguides

Douglas, Erica Ann; Mahony, Patrick; Starbuck, Andrew; Pomerene, Andrew; Trotter, Douglas C.; DeRose, Christopher T.

doi:10.1364/ome.6.002892

Cited by 27 publications

(12 citation statements)

References 24 publications

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“…High confinement is necessary for tailoring the waveguide dispersion to achieve phase matching in nonlinear processes as well as for tighter bends, thus allowing small footprints required in large-scale photonic systems. We compare the confinement factor and propagation loss achieved in this work with other state-of-the-art works realized in foundry compatible PECVD platform without any thermal treatment in Figure 6 [2,3,5,[27][28][29][30] .…”

Section: Fundamental Loss Extraction and Discussionmentioning

confidence: 97%

Ultra‐Low‐Loss Silicon Nitride Photonics Based on Deposited Films Compatible with Foundries

Okawachi

Gil-Molina

et al. 2023

Laser & Photonics Reviews

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The fabrication processes of silicon nitride (Si3N4) photonic devices used in foundries require low temperature deposition, which typically leads to high propagation losses. Here, we show that propagation loss as low as 0.42 dB/cm can be achieved using foundry compatible processes by solely reducing waveguide surface roughness. By post-processing the fabricated devices using rapid thermal anneal (RTA) and furnace anneal, we achieve propagation losses down to 0.28 dB/cm and 0.06 dB/cm, respectively. These low losses are comparable to the conventional devices using high temperature, high-stress LPCVD films. We also tune the dispersion of the devices, and proved that these devices can be used for linear and nonlinear applications. Low threshold parametric oscillation, broadband frequency combs and narrow-linewidth laser are demonstrated.Our work demonstrates the feasibility of scalable photonic systems based on foundries.

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Section: Fundamental Loss Extraction and Discussionmentioning

confidence: 97%

Ultra‐Low‐Loss Silicon Nitride Photonics Based on Deposited Films Compatible with Foundries

Okawachi

Gil-Molina

et al. 2023

Laser & Photonics Reviews

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“…It has exceptionally low leakage current and can be deposited via CMOS-compatible, low temperature sputtering. A silicon dioxide layer above the AlN's top electrode provides an optical buffer for the ultra-low-loss silicon nitride photonics layer [39] as seen in Fig. 1(c).…”

Section: Introductionmentioning

confidence: 99%

CMOS-compatible, piezo-optomechanically tunable photonics for visible wavelengths and cryogenic temperatures

et al. 2019

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We demonstrate a platform for phase and amplitude modulation in silicon nitride photonic integrated circuits via piezo-optomechanical coupling using tightly mechanically coupled aluminum nitride actuators. The platform, fabricated in a CMOS foundry, enables scalable active photonic integrated circuits for visible wavelengths, and the piezoelectric actuation functions without performance degradation down to cryogenic temperatures. As an example of the potential of the platform, we demonstrate a compact (~40 μm diameter) silicon nitride ring resonator modulator operating at 780 nm with intrinsic quality factors in excess of 1.5 million, >10 dB change in extinction ratio with 2 V applied, a switching time less than 4 ns, and a switching energy of 0.5 pJ/bit. We characterize the exemplary device at room temperature and 7 K. At 7 K, the device obtains a resistance of approximately 2x10 13 Ohms, allowing it to operate with sub-picowatt electrical power dissipation. We further demonstrate a Mach-Zehnder modulator constructed in the same platform with piezoelectrically tunable phase shifting arms, with 750 ns switching time constant and 20 nW steady-state power dissipation at room temperature.

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“…The use of deuterium rather than hydrogen in the silane precursor effectively eliminates the N-H bonds, the source of high 8 of 83 optical absorption in the telecom band, without needing to anneal the devices at high temperatures (> 1000 °C). A waveguide propagation loss of ~0.31 dB/cm in the range of 1.5 µm -1.6 µm was achieved by using isotopically substituted precursors in the plasmaenhanced chemical vapor deposition (PECVD) process to shift the N-H overtone absorption band from ~1.5 µm to ~2 µm [120]. Figure 4(b-ⅰ) shows a D-SiN MRR used for optical microcomb generation, which had a radius of ~23 µm and a Q factor of ~5.6 × 10 5 .…”

Section: Materials Platformsmentioning

confidence: 99%

Integrated Optical Frequency Microcomb Applications

Moss¹

2023

Preprint

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Optical microcombs represent a new paradigm for generating laser frequency combs based on compact chip-scale devices, which have underpinned many modern technological advances for both fundamental science and industrial applications. Along with the surge in activity related to optical micro-combs in the past decade, their applications have also experienced rapid progress ‒ not only in traditional fields such as frequency synthesis, signal processing, and optical communications, but also in new interdisciplinary fields spanning the frontiers of light detection and ranging (LiDAR), astronomical detection, neuromorphic computing, and quantum optics. This paper reviews the applications of optical microcombs. First, an overview of the devices and methods for generating optical microcombs is provided, which are categorized into material platforms, device architectures, soliton classes, and driving mechanisms. Second, the broad applications of optical microcombs are systematically reviewed, which are categorized into microwave photonics, optical communications, precision measurements, neuromorphic computing, and quantum optics. Finally, the current challenges and future perspectives are discussed.

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Effect of precursors on propagation loss for plasma-enhanced chemical vapor deposition of SiN_x:H waveguides

Cited by 27 publications

References 24 publications

Ultra‐Low‐Loss Silicon Nitride Photonics Based on Deposited Films Compatible with Foundries

Ultra‐Low‐Loss Silicon Nitride Photonics Based on Deposited Films Compatible with Foundries

CMOS-compatible, piezo-optomechanically tunable photonics for visible wavelengths and cryogenic temperatures

Integrated Optical Frequency Microcomb Applications

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