Effect of power variation on wettability and optical properties of co-sputtered titanium and zirconium oxynitride films

Rawal, Sushant K.; Chawla, Amit Kumar; Jayaganthan, R.; Chandra, Ramesh

doi:10.1007/s12034-013-0486-8

Cited by 12 publications

(3 citation statements)

References 42 publications

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“…In the films deposited at lower pressure of 0.7 Pa with supported discharge, the onset of crystallinity starts at the power of 80 W with a preferred orientation of (0 0 2), while no crystallinity has been observed in the films prepared at 60 W. Further increase in power to 100 W resulted in another preferred orientations of (1 0 0) along with (0 0 2). At a power of 120 W, the intensity of the peaks increased with the appearance of (1 0 1) peak [20]. Similar results were obtained by Chawla et al [9] who prepared Ti thin films by DC magnetron sputtering at substrate temperature of 200°C.…”

Section: Structural Analysissupporting

confidence: 84%

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Kavitha

Kannan

Rajashabala

2017

Materials Science-Poland

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The present paper describes the effect of target power on the properties of Ti thin films prepared by DC magnetron sputtering with (triode mode) and without (diode mode) supported discharge. The traditional diode magnetron sputtering with an addition of a hot filament has been used to sustain the discharge at a lower pressure. The effect of target power (60, 80, 100 and 120 W) on the physical properties of Ti thin films has been studied in diode and triode modes. XRD studies showed that the Ti thin films prepared at a target power up to 100 W in diode mode were amorphous in nature. The Ti thin films exhibited crystalline structure at much lower target power of 80 W with a preferred orientation along (0 0 2) plane. The grain size of Ti thin films prepared in triode mode increased from 64 nm to 80 nm, whereas in diode mode, the grain size increased from 2 nm to 5 nm. EDAX analysis confirmed that the incorporation of reactive gases was lower in triode mode compared to diode mode. The electrical resistivity of Ti thin films deposited in diode mode was found to be 85 µΩ·cm (target power 120 W). The electrical resistivity of Ti thin films in triode mode was found to be deceased to 15.2 µΩ·cm (target power 120 W).

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Section: Structural Analysissupporting

confidence: 84%

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Kavitha

Kannan

Rajashabala

2017

Materials Science-Poland

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“…20,21,23,25,27 While oxynitride phases have been observed in the as-deposited films in some cases, 26,30,31 several factors such as total pressure, power, and substrate temperature during sputtering are likely to simultaneously control both the composition and crystal structure of the as-deposited oxynitride chemistries. To decouple the temperature-dependent reactivity of the growing film in sputter atmosphere and thermally activated crystallization, we demonstrate RTP as postdeposition, iso-compositional crystallization process that provides access to high-temperature phases without compromising anion stoichiometry.…”

Section: Introductionmentioning

confidence: 99%

Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

et al. 2015

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Recent efforts have demonstrated enhanced tailoring of material functionality with mixed anion materials, yet exploratory research with mixed anion chemistries is limited by the sensitivity of these materials to synthesis conditions. Synthesis of a particular metal oxynitride compound by traditional reactive annealing requires specific, limited ranges of both oxygen and nitrogen chemical potentials to establish equilibrium between the solid-state material and a reactive atmosphere. Using Ta-O-N as an example system, we describe a combination of reactive sputter deposition and rapid thermal processing (RTP) for synthesis of mixed anion inorganic materials. Heuristic optimization of reactive gas pressures to attain a desired anion stoichiometry is discussed, and the ability of RTP to enable amorphous to crystalline transitions without preferential anion loss is demonstrated through the controlled synthesis of nitride, oxide, and oxynitride phases.

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“…Titanium and zirconium oxynitride films are composed of a mixture of oxides, nitrides, and carbides, which gives them unique surface properties that can be tailored to specific applications. Rawal’s group [ 59 ] conducted a study on the deposition of TiNO and ZrNO mixture films using the co-sputtering of titanium and zirconium targets with reactive RF magnetron sputtering on Corning1737 glass substrates. The films were found to be sensitive to the power variation of both targets, and it was observed that the structure of the film changed from amorphous oxide to oxynitride films as the power increased.…”

Section: Oxide Hydrophobic Thin Filmsmentioning

confidence: 99%

Review on Hydrophobic Thin Films Prepared Using Magnetron Sputtering Deposition

et al. 2023

Materials

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Hydrophobic thin films have gained significant attention due to their broad applications in self-cleaning, anti-corrosion, anti-icing, medicine, oil–water separation, and other fields. The target hydrophobic materials can be deposited onto various surfaces thanks to the scalable and highly reproducible nature of magnetron sputtering, which is comprehensively overviewed in this review. While alternative preparation methods have been extensively analyzed, a systematic understanding of hydrophobic thin films fabricated using magnetron sputtering deposition is still absent. After outlining the fundamental mechanism of hydrophobicity, this review briefly summarizes three types of sputtering-deposited thin films that originate from oxides, polytetrafluoroethylene (PTFE), and diamond-like carbon (DLC), respectively, primarily focusing on the recent advances in their preparation, characteristics, and applications. Finally, the future applications, current challenges, and development of hydrophobic thin films are discussed, and a brief perspective on future research directions is provided.

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Effect of power variation on wettability and optical properties of co-sputtered titanium and zirconium oxynitride films

Cited by 12 publications

References 42 publications

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Combining reactive sputtering and rapid thermal processing for synthesis and discovery of metal oxynitrides

Review on Hydrophobic Thin Films Prepared Using Magnetron Sputtering Deposition

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