Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

Shizuno, Miyako; Taniguchi, Jun; Ogino, Kenta; Ishikawa, Kiyoshi

doi:10.1166/jnn.2009.j040

Cited by 5 publications

(3 citation statements)

References 6 publications

(7 reference statements)

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“…Moreover, when the sunlight is directed to a room's ceiling, the brightness in the core area of the room can be increased. Galvanoformung, Abformung) and LIGA-like processes [14], and ultraprecision machining technology [15]. In ultraprecision machining technology, the machining profile of the ultraprecision machining technology is controlled via the relative motion of the cutting tool and the workpiece or the shape of a tool tip.…”

Section: Principle and Methodsmentioning

confidence: 99%

“…The reliable technologies for fabricating the mold used in imprinting process that have been developed so far include e-beam lithography [10,13], LIGA (German Acronym for Lithografie, Galvanoformung, Abformung) and LIGA-like processes [14], and ultraprecision machining technology [15]. In ultraprecision machining technology, the machining profile of the ultraprecision machining technology is controlled via the relative motion of the cutting tool and the workpiece or the shape of a tool tip.…”

Section: Introductionmentioning

confidence: 99%

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Design and Manufacture of a Novel Sunlight Guiding Panel

Hsu

Xie

2019

Coatings

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With technological advancement, energy consumption and lack of energy supply are inevitable. Approximately 20% of total energy consumption is used for artificial light in standard office buildings. To reduce energy consumption for illumination purposes, a sunlight guiding panel was used to increase the amount of sunlight available indoors. However, in most designs of a sunlight guiding panel, the panel has to be placed on the outdoor surface of a window glass. This type of design is inconvenient for assembling and cleaning. To enhance the practicality of a sunlight guiding panel, we attempted to place the sunlight guiding panel on the indoor surface of a window glass. The simulation results revealed that when the sunlight guiding panel was placed on the indoor surface of a window glass, the aspect ratio of the light-guiding structure of the sunlight guiding panel had to be increased for guiding the sunlight from outdoors so as to increase the amount of sunlight indoors. To fabricate the proposed sunlight guiding panel, UV nanoimprint lithography was applied to pattern the light-guiding structure of the sunlight guiding panel. Moreover, a mold with a high-precision light-guiding structure was used in UV nanoimprint lithography. The mold was fabricated using ultraprecision machining technology. Both analytical and experimental investigations were conducted to confirm the proposed design. The average light-guiding efficiency was 89.9% with a solar elevation angle range of 35 • to 65 • , and the experimental results agreed well with the simulation results. This study elucidates light-guiding efficiency when the sunlight guiding panel is placed on the indoor surface of a window glass, which can increase the usage convenience and application potential of sunlight guiding panels. micromachining or nanomachining technique is required for manufacturing a sunlight guiding panel. Due to the difficulty in producing a sunlight guiding panel, a sunlight guiding panel has to be placed on the outdoor surface of a window glass in most designs of sunlight guiding panels [8,9]. This type of design is inconvenient for assembling and cleaning.

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Section: Principle and Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Design and Manufacture of a Novel Sunlight Guiding Panel

Hsu

Xie

2019

Coatings

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“…When UV-NIL was carried out, the sample was coated with a release agent (Optool DSX; Daikin Industries Co., Tokyo) [14]. The combination of the EB resist and the release agent allows UV-NIL duplication of a pattern with a high aspect ratio (over 3) [15]; the aspect ratio of our target pattern is at the most 1.2. The height of the sample was examined with an atomic force microscope (AFM) (SPM-9600; Shimadzu Co., Kyoto).…”

Section: Experimental Methodsmentioning

confidence: 99%

Fabrication of eight-step diffractive optical element for hologram-ROM

Shinonaga

Ogino

Unno

et al. 2015

Microelectronic Engineering

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Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake

Manabe

Taniguchi

Ishikawa

2009

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Nanoimprint lithography (NIL) is regarded as the lithographic technology of the next generation. The photolithography is advancing to perform resolution of 32nm. Although photolithography and high-voltage-acceleration (>50kV) electron-beam-lithography (EBL) techniques are currently used in commercialized lithography, these two methods involve high costs. The authors therefore attempted to fabricate arrays of dots, each with a diameter of 20nm or less, by using low-voltage-acceleration EBL. NIMO-P0701 was used as a positive-type inorganic EB resist in this study and a combination of NIMO-P0701 and low-acceleration-voltage EBL was established. Attempts were then made to use a postexposure bake (PEB) to further reduce the size of the dot array patterns. Finally, the developed dot array mold was transferred by UV-NIL without dry etching. As a result, arrays of dots with a diameter of 20 or 10nm were fabricated by EBL at an acceleration voltage of 4kV and subsequent PEB. The resulting mold was developed with buffered hydrofluoric acid. The developed NIMO-P0701 pattern was used for NIL, and pattern transfer to a UV-curable resin was successfully achieved. In this case, the optimum transfer pressure was 4MPa. Additionally, dot arrays initially produced with diameters of 30 and 18nm were shrunk to sizes of 20 and 10nm, respectively, by means of PEB.

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Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

Cited by 5 publications

References 6 publications

Design and Manufacture of a Novel Sunlight Guiding Panel

Design and Manufacture of a Novel Sunlight Guiding Panel

Fabrication of eight-step diffractive optical element for hologram-ROM

Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake

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