2020
DOI: 10.1016/j.apsusc.2020.145496
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Effect of post deposition annealing on the electrical properties of YSZ thin films deposited by pulsed laser technique

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Cited by 3 publications
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“…To obtain high-quality ITZO thin films, there are two sets of parameters in the fabrication: sputtering process and postdeposition process. Post-deposition treatments include postannealing [13][14][15], ionizing radiation [16], laser radiation plasma treatment [17], and ultraviolet radiation [18] etc. Among them, post-annealing treatment is a simple and effective method to improve the quality of thin films and devices.…”
Section: Introductionmentioning
confidence: 99%
“…To obtain high-quality ITZO thin films, there are two sets of parameters in the fabrication: sputtering process and postdeposition process. Post-deposition treatments include postannealing [13][14][15], ionizing radiation [16], laser radiation plasma treatment [17], and ultraviolet radiation [18] etc. Among them, post-annealing treatment is a simple and effective method to improve the quality of thin films and devices.…”
Section: Introductionmentioning
confidence: 99%