Effect of post annealed treatment on HfN thin films prepared by DC reactive magnetron sputtering

Phae-ngam, Wuttichai; Prathumsit, Jedsada; Gitgeatpong, G.; Chananonnawathorn, Chanunthorn; Lertvanithphol, Tossaporn; Saekow, Bunpot; Nakajima, Hideki; Horprathum, Mati

doi:10.1063/5.0023267

Cited by 6 publications

(2 citation statements)

References 11 publications

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“…Because of their minimum work function, HfN films are highly favorable as an emitter material in field emitter arrays. [ 254,256 ] Besides their excellent mechanical, electrical, and optical properties, HfN films find their applications in the areas of hard coatings, [ 257,258 ] cutting tools, [ 255,259 ] diffusion barriers, [ 260 ] microelectronics, [ 261–263 ] optical field, [ 264 ] solar energy, [ 265,266 ] crucibles, [ 253,267 ] etc.…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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“…To form the films, physical vapor deposition (PVD) techniques, such as magnetron sputtering or pulsed laser deposition, are generally used. Although several research groups have demonstrated the fabrication of HfN thin films with controllable surface morphology and chemical composition, external energy sources, such as substrate bias voltage [14], substrate heating during growth [15], post annealing [16], and ionized magnetron sputter deposition [17], must be included. Externally introduced procedures complicate and increase the expense of the operation, and they are not accessible for fabricating an HfN film at room temperature.…”

Section: Introductionmentioning

confidence: 99%

Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates

et al. 2022

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This study successfully demonstrated the tailoring properties of hafnium nitride (HfN) thin films via reactive gas-timing (RGT) RF magnetron sputtering for surface-enhanced Raman spectroscopy (SERS) substrate applications. The optimal RGT sputtering condition was investigated by varying the duration time of the argon and nitrogen gas sequence. The RGT technique formed thin films with a grain size of approximately 15 nm. Additionally, the atomic ratios of nitrogen and hafnium can be controlled between 0.24 and 0.28, which is greater than the conventional technique, resulting in a high absorbance in the long wavelength region. Moreover, the HfN thin film exhibited a high Raman signal intensity with an EF of 8.5 × 104 to methylene blue molecules and was capable of being reused five times. A superior performance of HfN as a SERS substrate can be attributed to its tailored grain size and chemical composition, which results in an increase in the hot spot effect. These results demonstrate that the RGT technique is a viable method for fabricating HfN thin films with controlled properties at room temperature, which makes them an attractive material for SERS and other plasmonic applications.

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Room temperature deposition of crystalline HfN thin films by DC reactive magnetron sputtering

Phae-ngam

Lertvanithphol

Chananonnawathorn

et al. 2021

Materials Today: Proceedings

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Effect of post annealed treatment on HfN thin films prepared by DC reactive magnetron sputtering

Cited by 6 publications

References 11 publications

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates

Room temperature deposition of crystalline HfN thin films by DC reactive magnetron sputtering

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