2012
DOI: 10.1016/j.apsusc.2012.05.059
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Effect of polymer binder on surface texturing by photoembossing

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Cited by 7 publications
(12 citation statements)
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“…Figure (c) shows the effect of processing temperature on height of relief structures. The effect of processing temperature on photoembossing has also been studied . Similar to studies of other photopolymer systems, the height of the relief structures increases as the temperature increases till an optimum condition after which it begins to decrease.…”
Section: Resultsmentioning
confidence: 53%
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“…Figure (c) shows the effect of processing temperature on height of relief structures. The effect of processing temperature on photoembossing has also been studied . Similar to studies of other photopolymer systems, the height of the relief structures increases as the temperature increases till an optimum condition after which it begins to decrease.…”
Section: Resultsmentioning
confidence: 53%
“…temperature on photoembossing has also been studied. 25,28,33,34 Similar to studies of other photopolymer systems, the height of the relief structures increases as the temperature increases till an optimum condition after which it begins to decrease. However, unlike these photoembossing studies, relief structures could also be formed at room temperature below the Tg of the blend (Figure 3).…”
Section: Photoembossingmentioning
confidence: 53%
“…Compared to photolithography, which is the most commonly used method to pattern thin films or substrates by microfabrication, photoembossing does not require a wet-etching step which makes it more cost-effective and environmental friendly. In this method, the shape of the relief structures is determined by the pattern of the photomask while our previous work has confirmed that the depth of the relief structures can be adjusted by controlling the UV dosage and temperature during the heating stage [25,27]. By this process of photoembossing and controlled UV dosages, we successfully fabricated photopolymer films with 1 µm high relief structures and 6, 10, and 20 µm pitches, as well as films with 2.5 µm high microstructures with a 20 µm pitch.…”
Section: Discussionmentioning
confidence: 99%
“…To produce smooth films as control substrates, after drying, the films were exposed to direct UV light for 1000 s causing all the monomers to polymerize. To produce surface textured samples, films were covered with a photomask and exposed to UV light for 30 s and then heated for 20 min at 120 °C to accelerate the diffusion of unreacted monomer, and which previous studies indicated as the optimum developing temperature [25]. Moreover, it was shown that there is an optimum UV dosage required to create any particular relief structure [25,26].…”
Section: Methodsmentioning
confidence: 99%
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