2012
DOI: 10.1143/jjap.51.04dh02
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Effect of Phase Purity on Dislocation Density of Pressurized-Reactor Metalorganic Vapor Phase Epitaxy Grown InN

Abstract: The effect of the metastable zincblende (ZB) InN inclusion in the stable wurtzite (WZ) InN on the threading dislocation densities (TDDs) of an InN film grown by pressurized-reactor metalorganic vapor phase epitaxy has been studied by X-ray diffraction measurements. InN films are directly grown on c-plane sapphire substrates with nitrided surfaces at 1600 Torr with the different growth temperature from 500 to 700 °C. Films including ZB-InN show the correlation between the ZB volume fraction and the edge compone… Show more

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Cited by 5 publications
(1 citation statement)
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“…The atomic-scale resolved interface structure, particularly the direct visualization of N atoms, demonstrates the successful growth of high-quality InGaN/GaN MQWs on the semipolar (01-11) plane. Moreover, such design and successful growth of high-quality InGaN/GaN MQWs on the semipolar (01-11) GaN substrate would preferably solve the challenges of growing N-polar InGaN/GaN MQWs. …”
Section: Resultsmentioning
confidence: 99%
“…The atomic-scale resolved interface structure, particularly the direct visualization of N atoms, demonstrates the successful growth of high-quality InGaN/GaN MQWs on the semipolar (01-11) plane. Moreover, such design and successful growth of high-quality InGaN/GaN MQWs on the semipolar (01-11) GaN substrate would preferably solve the challenges of growing N-polar InGaN/GaN MQWs. …”
Section: Resultsmentioning
confidence: 99%