Effect of Partial Pressure of Oxygen, Target Current, and Annealing on Dc Sputtered Tungsten Oxide (Wo3) Thin Films for Electrochromic Applications

Kumar, K. Naveen; Sattar, Sheik Abdul; Shaik, Habibuddin; Dhananjaya, Merum; Pawar, Amruth S.; Prakash, Nunna Guru; Chandrashekar, L. N.; Jafri, R. Imran; Aishwarya, P

doi:10.2139/ssrn.4391380

2023

DOI: 10.2139/ssrn.4391380

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Effect of Partial Pressure of Oxygen, Target Current, and Annealing on Dc Sputtered Tungsten Oxide (Wo3) Thin Films for Electrochromic Applications

K. Naveen Kumar¹,

Sheik Abdul Sattar²,

Habibuddin Shaik³

et al.

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Effect of Partial Pressure of Oxygen, Target Current, and Annealing on Dc Sputtered Tungsten Oxide (Wo3) Thin Films for Electrochromic Applications

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