2015
DOI: 10.7498/aps.64.033101
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Effect of oxygen vacancy on lattice and electronic properties of HfO2 by means of density function theory study

Abstract: HfO2, as a gate dielectric material for the charge trapping memory, has been studied extensively due to its merits such as high k value, good thermal stability, and conduction band offset relative to Si, etc.. In order to understand the reason why the charge trapping efficiency is improved by high k capture layer with respect to charge trapping type memory, the variation of HfO2 crystal texture induced by oxygen vacancy and the influences of it are investigated using the first principle calculation based on de… Show more

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