Effect of Oxygen Contents on the Property of Hydrophobic Thin Films Deposited on Flexible Substrates Using Plasma-enhanced CVD

Liu, Day-Shan; Wu, Cheng-Yang; Huang, Bing−Wen; Lee, Ching-Ting

doi:10.7567/ssdm.2006.p-10-9

Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials 2006

DOI: 10.7567/ssdm.2006.p-10-9

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Effect of Oxygen Contents on the Property of Hydrophobic Thin Films Deposited on Flexible Substrates Using Plasma-enhanced CVD

Day-Shan Liu¹,

Cheng-Yang Wu²,

Bing−Wen Huang³

et al.

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Effect of Oxygen Contents on the Property of Hydrophobic Thin Films Deposited on Flexible Substrates Using Plasma-enhanced CVD

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