2017
DOI: 10.1007/s10854-017-7517-y
|View full text |Cite
|
Sign up to set email alerts
|

Effect of oxide based graded buffer and bottom n-layer on the performance of the single junction amorphous silicon solar cells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2019
2019
2021
2021

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 13 publications
0
1
0
Order By: Relevance
“…Increasing the width of the optical gap with the presence of carbon in the network layer of the p-type a-SiC: H followed by a worsening of its electrical properties and increased disorder [9][10][11]. The presence of carbon can increase the width of the state density in the tail region of the energy band, which can decrease the drift mobility thus worsening the electrical properties, whereas the reduction in disorder is thought to be due to the presence of trigonal C=C sp 2 in the sp 3 tetrahedral amorphous network [12][13]. The state density in the tail of the valence and conduction bands is reflected in the slope of the optical absorption curve so that it can be used to determine the electrical properties and amorphous semiconductor disorder.…”
Section: Introductionmentioning
confidence: 99%
“…Increasing the width of the optical gap with the presence of carbon in the network layer of the p-type a-SiC: H followed by a worsening of its electrical properties and increased disorder [9][10][11]. The presence of carbon can increase the width of the state density in the tail region of the energy band, which can decrease the drift mobility thus worsening the electrical properties, whereas the reduction in disorder is thought to be due to the presence of trigonal C=C sp 2 in the sp 3 tetrahedral amorphous network [12][13]. The state density in the tail of the valence and conduction bands is reflected in the slope of the optical absorption curve so that it can be used to determine the electrical properties and amorphous semiconductor disorder.…”
Section: Introductionmentioning
confidence: 99%