Effect of nitrogen flow rate on structural and mechanical properties of Zirconium Tungsten Nitride (Zr–W–N) coatings deposited by magnetron sputtering

Dubey, Preeti; Arya, Vinod K.; Srivastava, S. P.; Singh, Devendra Kumar; Chandra, Ramesh

doi:10.1016/j.surfcoat.2013.09.045

Cited by 23 publications

(16 citation statements)

References 41 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…As reported by several authors and widely accepted in the literature, mechanical properties decrease when the film exhibits an amorphous structure and also when the internal stresses in the films become relaxed [41,42,44]. For instance, as demonstrated by Dubey et al, the magnitudes of hardness and Young's modulus are directly related to the structure [44]. In their work on binary and ternary nitrides, it was shown that that the hardness and elastic modulus decrease when the film becomes amorphous due to the lack of hindrance to dislocation movements that grain growth tends to promote [44].…”

Section: Resultsmentioning

confidence: 75%

“…The other contributing factor to the lower values observed is the fact that the W-O-N films were grown on silicon substrates rather than substrates made of steel or superalloy [43]. As reported by several authors and widely accepted in the literature, mechanical properties decrease when the film exhibits an amorphous structure and also when the internal stresses in the films become relaxed [41,42,44]. For instance, as demonstrated by Dubey et al, the magnitudes of hardness and Young's modulus are directly related to the structure [44].…”

Section: Resultsmentioning

confidence: 94%

See 1 more Smart Citation

Nitrogen incorporation and composition facilitated tailoring of the optical constants and dispersion energy parameters of tungsten oxynitride films

Nunez

Tarango

Murphy

et al. 2016

Journal of Alloys and Compounds

View full text Add to dashboard Cite

a b s t r a c tOptical properties, including the index of refraction, extinction coefficient and band gap of 100 nm thick tungsten oxynitride (W-O-N) films are reported. In addition, the Wemple and DiDomenico (WDD) model was used to calculate the dispersion energies and oscillator energies of the films, establishing a correlation among the films' optical, chemical, and physical properties, as a function of nitrogen content. Nitrogen concentration in the W-O-N films was varied by adjusting the nitrogen gas flow rate from 0 to 20 sccm while keeping total gas flow (nitrogen þ oxygen þ argon) constant at 40 sccm. Both the index of refraction (n) and extinction coefficient (k) of W-O-N films demonstrated a high degree of sensitivity to the nitrogen content during deposition. The optical constants of films fabricated without any nitrogen correspond to transparent W-oxide (WO 3 ) where n 550 ¼ 2.1 and k 550 ¼ 0.0. The magnitude of the spectral response for both n and k tends to increase with increasing nitrogen content. Systematic increases of the films' nitrogen content lead to the formation of W-oxide (E g z 3 eV) / W-O-N oxynitride semiconductor (E g z 2 eV) / N-rich W-O-N semi-metal (E g < 2 eV) / WN 2 type metallic transition was evident in dispersion profiles of n and k for W-O-N films with increasing nitrogen content. The corresponding mechanical characteristics, namely hardness (H) and Young's modulus (E), attain a maximum of 4.46 GPa and 98.5 GPa, respectively, at a nitrogen flow rate of 5 sccm, at which point H and E values decrease to attain 3.57 GPa and 72.91 GPa, respectively. The trend observed in H and E values correlate with the W-O and W-N bonds formation in W-O-N along with the interruption of local epitaxy attributed to increasing nitrogen content within the growth chamber. A correlation among the nitrogen content, optical constants and physical properties, along with the associated dispersion model, is presented to account for the optical properties of sputter-deposited W-O-N films. The results demonstrate that tailoring the properties of W-O-N films for desired applications can be achieved by tuning the nitrogen content and chemical composition.

show abstract

Section: Resultsmentioning

confidence: 75%

Section: Resultsmentioning

confidence: 94%

Nitrogen incorporation and composition facilitated tailoring of the optical constants and dispersion energy parameters of tungsten oxynitride films

Nunez

Tarango

Murphy

et al. 2016

Journal of Alloys and Compounds

View full text Add to dashboard Cite

show abstract

“…The results also indicate a strong dependence of coatings' texture on U k . It can be noted that the ZrWN coatings exhibit only one group of peaks of fcc structure indicating a single phase solid-solution nitride formation rather than the co-existence of separated nitrides like ZrN and W 2 N. 18 The elemental composition probed using EDS measurements (not shown) revealed that the atomic percentages of Zr, W and N are almost constant as a function of U k . The nominal composition was found to be Zr 21 W 19 N 60 .…”

mentioning

confidence: 98%

“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] Since the very first successful commercialization of TiN, the field of nitrides has become widespread and diversified to include other complex applications such as automotive, aerospace, microelectronics, and biomedical technologies. [15][16][17][18][19][20] However, rapid progress made coupled with ever increasing demand for performance and efficiency enhancement and current nanotechnology challenges are the prime factors constantly driving the thrust to design new coating materials and/or new architectures to further improve the properties and high-temperature stability of the coatings. 6,[8][9][10][11][12][13][14][15] Many of the modern engineering applications require tuning the toughness (K IC ) without sacrificing the hardness (H) of the coating.…”

mentioning

confidence: 99%

See 1 more Smart Citation

Toughness enhancement in zirconium-tungsten-nitride nanocrystalline hard coatings

et al. 2016

Self Cite

View full text Add to dashboard Cite

An approach is presented to increase the toughness (KIC) while retaining high hardness (H) of Zr-W-N nanocrystalline coatings using energetic ions bombardment. Tuning KIC and H values was made possible by a careful control over the substrate bias, i.e., the kinetic energy (Uk∼9-99 J/cm3) of the bombarding ions, while keeping the deposition temperature relatively low (200 oC). Structural and mechanical characterization revealed a maximum wear resistance (H/Er∼0.23) and fracture toughness (KIC∼2.25 MPam) of ZrWN coatings at Uk∼72 J/cm3. A direct Uk-microstructure-KIC-H relationship suggests that tailoring mechanical properties for a given application is possible by tuning Uk and, hence, ZrWN-coatings’ microstructure.

show abstract

Effects of deposition parameters on the structure and properties of ZrN, WN and ZrWN films

Chen

Kuo

et al. 2019

Bull Mater Sci

View full text Add to dashboard Cite

This paper examines optimal settings for deposition parameters for transition metal nitride (ZrN, WN and ZrWN) thin films that are deposited on tungsten carbide tools and glass substrates using direct current (DC) reactive sputtering with pure Zr and W metal targets and Ar plasma and N 2 reactive gases. Experiments using the grey-Taguchi method are conducted to study the effects of deposition parameters (substrate plasma etching time, N 2 /(N 2 + Ar) flow rate, deposition time and substrate temperature) on a film that is deposited on a cutting tool that is used for dry machining and on the films' mechanical properties. The substrates' surfaces are etched using oxygen plasma pretreatment. It is clear that the coated film is homogeneous, very compact and exhibits perfect adherence to the substrate. The results of grey relational analysis show for the dry turning AISI 304 stainless steel that the surface roughness is approximately R a = 0.70 μm and that the flank wear is approximately 14.02 μm. The grey relational analysis shows that the period for which the substrate (tungsten carbide tool) is under plasma-etched pretreatment has the most significant effect on both the surface roughness and flank wear. The coated films are analysed using scanning electron microscopy (SEM), energy-dispersive spectroscopy (EDS), transmission electron microscopy (TEM), X-ray diffraction and a nano-indenter. The ternary nitride (ZrWN)-coated specimens exhibit better mechanical properties than binary nitride (ZrN and WN) specimens. The optimum ZrWN coating exhibits the greatest hardness (H), elastic modulus (E) and H/E values.

show abstract

Effect of nitrogen flow rate on structural and mechanical properties of Zirconium Tungsten Nitride (Zr–W–N) coatings deposited by magnetron sputtering

Cited by 23 publications

References 41 publications

Nitrogen incorporation and composition facilitated tailoring of the optical constants and dispersion energy parameters of tungsten oxynitride films

Nitrogen incorporation and composition facilitated tailoring of the optical constants and dispersion energy parameters of tungsten oxynitride films

Toughness enhancement in zirconium-tungsten-nitride nanocrystalline hard coatings

Effects of deposition parameters on the structure and properties of ZrN, WN and ZrWN films

Contact Info

Product

Resources

About