Effect of nitrogen doping on TiO_xN_y thin film formation at reactive high-power pulsed magnetron sputtering

Abstract

To cite this version:Vitezslav Stranak, Marion Quaas, Robert Bogdanowicz, Hartmut Steffen, Harm Wulff, et al.. Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (28) AbstractThe paper is focused on a study of formation of TiO x N y thin films prepared by pulsed magnetron sputtering of metallic Ti target. Oxygen and nitrogen were delivered into the discharge in the form of reactive gases O 2 and N 2 . The films were deposited by high-power impulse magnetron sputtering working with discharge repetition frequency f = 250 Hz at low (p = 0.75 Pa) and high (p = 10 Pa) pressure. The substrates were on floating potential and thermally stabilized at room temperature during deposition process. Post-deposition thermal annealing was not employed. The chemical composition from XPS diagnostic reveals formation of TiO x N y structure at low flow rate of oxygen in the discharge gas mixture. This result is confirmed by XRD investigation of N elements incorporation into the Ti-O lattice. Decrease of band-gap to values Eg ∼ 1.6 eV in TiOxNy thin film is attributed to formed Ti-N bonds. The discharge properties were investigated by time-resolved optical emission spectroscopy. Time evolution of particular spectral lines (Ar + , Ti + , Ti) is presented together with peak discharge current.

Effect of low Fe3+ doping on characteristics, sonocatalytic activity and reusability of TiO2 nanotubes catalysts for removal of Rhodamine B from water

“…3(a) shows the typical XPS survey scan of the typical sample. The large amount of C element in the result was mainly attributed to carbon contamination during the transfer of the samples to the XPS device [22]. In addition, some residual carbon from organic precursors used in sol-gel method or carbon tape could have contributed to the C signal as detected by EDX.…”

Synthesis of p‐type N‐doped TiO2 thin films by co‐reactive magnetron sputtering

“…The binding energies and the splitting of 5.7 V of the first doublet matches with Ti 4+ (1/2) and (3/2) in TiO 2 . The second doublet is much more difficult to attribute since it can correspond to (i) Ti 3+ in bulk TiN, (ii) Ti 3+ associated to O vacancies in TiO 2 lattice, or (iii) Ti 2+ state for which TiO and TiN species contribute . However, the peak splitting of 6 eV and the position of the 2p 3/2 contribution are in favor of the presence of TiN .…”

Photocatalytic degradation of humic acids using substrate-supported Fe3+-doped TiO2 nanotubes under UV/O3 for water purification

“…The sharp XPS peaks for Ti, O, Fe, Na, and C were observed. The C element in the result was mainly attributed to carbon contamination during the transfer of the samples to the XPS device (Stranak et al 2010). The Na 1 s peak is due to the incomplete exchange of protons with Na + during acid washing with HCl (Pang and Abdullah 2012b).…”