Effect of niobium doping on the properties of molybdenum sulfides as cathode materials

Shin, Hyungcheol; Doer, H.J.; Deshpandey, C.V.; Fuqua, Peter D.; Dunn, Bruce; Bunshah, R.F.

doi:10.1016/0257-8972(88)90026-6

Cited by 6 publications

(4 citation statements)

References 12 publications

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“…Figures 2a, b, and c shows Raman spectra for the MoS 2 , Au-MoS 2 , and Ti-MoS 2 samples, respectively. For the MoS 2 coating, the scan revealed peaks which are consistent with the Raman active modes for MoS 2 (2H) [38][39][40]. A small peak at 408 cm -1 was also observed with the Ti-MoS 2 sample, however, no distinct MoS 2 peaks were observed with the Au content samples for the as-prepared coating.…”

Section: Methodssupporting

confidence: 66%

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

et al. 2010

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Solid lubricant coatings with co-sputtered metal and MoS 2 have shown favorable macrotribological properties at a wide range of contact stresses and humidity levels. These materials are also candidates for use in microcontacts and micro-electromechanical systems (MEMS), but their performance at this scale is poorly understood. For this study, microtribological properties of Au-MoS 2 and Ti-MoS 2 coatings, with varying metal additives of less than 15 at%, were examined using a nanoindentation instrument. Titanium and gold were chosen for this study as metal additives due to their different influence on the mechanical properties of the coating. The hardness and reduced modulus of the coatings increased with the addition of metal, when compared to pure MoS 2 . Reciprocating microscratch tests were performed with two spherical diamond tips (50 and 10 lm radii) in dry air. A range of normal loads were used between 0.2 and 5.0 mN. Friction and wear measurements were analyzed with respect to the variation in the contact pressure and compared to literature studies performed at the macroscale. Correlations were found between the coating mechanical properties, tip-coating adhesion, interfacial shear strength, and the formation of transfer films and tribofilms.

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Section: Methodssupporting

confidence: 66%

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

et al. 2010

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“…We fixed a threshold value of 1.1, corresponding to the intensity ratio of the MoS 2 A 1g band with respect to the amorphous species band located at 400-550 cm À1 , in order to consider the presence of MoS 2 . The sulfur-rich sulde, MoS 3 , known for its catalytic 38 and electrochemical properties, 34,39,40 can only be prepared as an amorphous substance. MoS 3 can be prepared by acidic precipitation of (NH 4 ) 2 MoS 4 , 41 by reacting molybdenum halides with hexamethyldisilathiane, 34 or as in the present work, by gentle thermal decomposition of (NH 4 ) 2 MoS 4 .…”

Section: Characterization By Raman Spectroscopymentioning

confidence: 99%

MoS₂ formation induced by amorphous MoS₃ species under lubricated friction

et al. 2018

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“…21,22 For example, the electrical resistivity of MoS 2 is too high for applications within electrochemical devices, so dopant addition dramatically increases the electrical conductivity of MoS 2 and other TMDs. 23,24 For applications as a catalyst for the hydrogen evolution reaction, metal dopants are often added to improve the catalyst activity, partly by increasing the concentration of active edge and kink sites. 25,26 Dopant incorporation into MoS 2 and other TMDs is also employed to control dopant concentration and dopant type for electronic applications, 27,28 and dopants may even alter the crystal structure.…”

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Electrodeposition of Ni-doped MoS₂ Thin Films

Giang

Adil

Suni

2020

J. Electrochem. Soc.

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Ni-doped MoS 2 thin films were fabricated by electrodeposition from electrolytes containing both MoS 4 2− and varying concentrations of Ni 2+ , followed by annealing at 400 °C for 2 h in an Ar atmosphere. The film resistivity decreased from 32.8 μΩ-cm for un-doped MoS 2 to 11.3 μΩ-cm for Ni-doped MoS 2 containing 9 atom% Ni. For all Ni dopant levels studied, only the X-ray diffraction (XRD) pattern expected for MoS 2 is observed, with the average grain size increasing with increasing Ni content. Ni-doped MoS 2 thin films were tested for their activity towards the hydrogen evolution reaction (HER) in 0.5 M H 2 SO 4 . Tafel equation fits reveal that the catalytic activity for the HER, as measured by the exchange current density, increases up to 6 atom% Ni, and then decreases slightly for 9 atom% Ni. Ni-doped MoS 2 thin films were also tested in 1.0 M Na 2 SO 4 for use within electrochemical supercapacitors, and the capacitance per unit area increases by 2-3x for 9 atom% Ni-doped MoS 2 relative to undoped MoS 2 . The highest capacitance obtained for Ni-doped MoS 2 during galvanostatic charge-discharge measurements is ∼300 F g −1 .

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Effect of niobium doping on the properties of molybdenum sulfides as cathode materials

Cited by 6 publications

References 12 publications

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

MoS₂ formation induced by amorphous MoS₃ species under lubricated friction

Electrodeposition of Ni-doped MoS₂ Thin Films

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Effect of niobium doping on the properties of molybdenum sulfides as cathode materials

Cited by 6 publications

References 12 publications

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

Microtribological Performance of Au–MoS2 and Ti–MoS2 Coatings with Varying Contact Pressure

MoS2 formation induced by amorphous MoS3 species under lubricated friction

Electrodeposition of Ni-doped MoS2 Thin Films

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MoS₂ formation induced by amorphous MoS₃ species under lubricated friction

Electrodeposition of Ni-doped MoS₂ Thin Films