Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition

Preparation and Characterization of Surface Photocatalytic Activity with NiO/TiO2 Nanocomposite Structure

“…To optimize the film’s photocatalytic activity, these amorphous TiO 2 films deposited onto the seed layer were then annealed at 600 °C for 30 min under ambient oxygen to result in the film crystallization with the anatase phase (denoted as the controlled TiO 2 film hereafter). The reason for the TiO 2 film deposited onto the seed layer and the mechanism responsible for the controlled TiO 2 film exhibiting a better photocatalytic activity than that of the TiO 2 film directly deposited onto the substrate, has been discussed elsewhere [ 28 ]. A metallic Ni film with a thickness of 20 nm was then evaporated onto the controlled TiO 2 film surface, and sequentially annealed at 450 °C, 550 °C and 650 °C, respectively, under oxygen ambient for 1 min to realize the surface with the NiO/TiO 2 nanocomposite structure.…”

Characterization of an Amorphous Titanium Oxide Film Deposited onto a Nano-Textured Fluorination Surface

“…Although the TiO x film with anatase structures has the best photocatalytic activity, the deposition and/or post-annealing temperature required to form anatase crystallinity is too high to limit such film applied to surface modification and packaging on the heat-sensitive substrates or devices. Accordingly, an effort was made to enhance the photocatalytic activity of an anatase-TiO x film at low temperature by realizing the p - n junction or doping with a specific dopant [ 8 , 9 , 10 ]. Alternatively, an amorphous TiO x film abundant in hydroxyl (O–H) functional groups on the film surface was found to be a promising substitute for exhibiting quality photocatalytic activity at a low temperature [ 11 , 12 ].…”