Effect of NaCl concentration in electrodeposited Co–P alloy thin films

Kim, Jung Hyun; Raja, M.; Thanikaikarasan, S.; Kim, Yong Deak; Srikumar, S. R.; Mahalingam, T.

doi:10.1016/j.apsusc.2009.02.037

Cited by 5 publications

(4 citation statements)

References 25 publications

(24 reference statements)

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“…As shown, the NaH 2 PO 2 addition can significantly decrease the reductive potential for the Co electrolyte, probably due to the catalytic effect of NaH 2 PO 2 . 25,[34][35][36] As the reductive potential becomes more positive, the NaH 2 PO 2 addition forms a Co(P) film. However, the current density sharply increases after the reductive potential for the NaH 2 PO 2 -added Co electrolyte, unlike the Co electrolyte, starting at approximately −1.4 V. This sharp increase in the current density is associated with the hydrogen evolution reaction.…”

Section: Resultsmentioning

confidence: 99%

“…Moreover, the Na + in NaH 2 PO 2 can affect the codeposition of Co(P) because the Na + can initiate the following reaction to improve the formation of the Co(P) film. 36 [ ]…”

Section: Resultsmentioning

confidence: 99%

“…[39][40][41] Because this study used an acidic solution, as well as the chosen deposition potential, the hydrogen reduction reaction can be partially suppressed. Na + can also effectively suppress the hydrogen evolution reaction in the NaH 2 PO 2 -added Co electrolyte by reducing the number of electrons to reduce H + for the hydrogen evolution, 36 thus enhancing the electrochemical deposition of the Co(P) film.…”

Section: Resultsmentioning

confidence: 99%

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Synthesis of Dilute Phosphorous-Embedded Co Alloy Films on a NiSi Substrate with a Superior Gap-Filling Capability for Nanoscale Interconnects

Fang

Cheng

et al. 2021

J. Electrochem. Soc.

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Nanoscale cobalt interconnection wire has a lower mean free path of electrons to reduce the electrical resistivity, therefore it has been increasingly studied as a promising interconnect material to replace the conventionally used copper in state-of-the-art nanoscale devices. This process further limits the space for barrier/seed layer deposition to conformally fill the narrow trenches/contact holes in nanoscale devices. Thus, an electrochemical approach not involving a conventional high-resistivity barrier is presented to study the gap-filling capability and properties of Co(P) films with a controlled composition on a NiSi substrate. Examining electrodeposited Co(P) films reveals that the composition is determined mainly by the deposition potential instead of the amount of NaH2PO2 in the electrolytes, yielding a film with a phosphorous concentration lower than 2.62 at.%. The lightly doped Co(P) film has an hexagonal close-packed Co structure with phosphorous atoms at the interstitial lattice site. A chronoamperometry study on the current transient during the electrochemical deposition indicates that NaH2PO2 addition can enhance the deposition of the Co(P) films. Hence, the Co(P) film developed here is capable of gap filling nanoscale trenches up to an aspect ratio of 5 and is practical as a contact plug material for NiSi in nanoscale devices.

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Section: Resultsmentioning

confidence: 99%

“…Moreover, the Na + in NaH 2 PO 2 can affect the codeposition of Co(P) because the Na + can initiate the following reaction to improve the formation of the Co(P) film. 36 [ ]…”

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

Synthesis of Dilute Phosphorous-Embedded Co Alloy Films on a NiSi Substrate with a Superior Gap-Filling Capability for Nanoscale Interconnects

Fang

Cheng

et al. 2021

J. Electrochem. Soc.

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“…The most common methods of deposition for Co͑P͒ films are electro- [24][25][26][27] and electroless [28][29][30] aqueous deposition chemistries, although sputtering 14,31,32 and chemical vapor deposition 33 ͑CVD͒ have also been reported. Herein, we report CVD of nc Co͑P͒ films from a single-source precursor, tetrakis͑trimethylphosphine͒cobalt͑0͒, ͑Me 3 P͒ 4 Co ͓Me =CH 3 ͔.…”

Section: Introductionmentioning

confidence: 99%

Nanocrystalline cobalt-based films with high thermal stability from a single molecule

Henderson

Rivers

Bost

et al. 2009

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inMagnetic permeability of Si-rich (FeCoNi)-based nanocrystalline alloy: Thermal stability in a wide temperature range J. Appl. Phys. 113, 17A310 (2013); 10.1063/1.4794718Self-assembly of multiwalled carbon nanotubes from quench-condensed CNi 3 films Structure of electroless deposited Co 0.9 W 0.02 P 0.08 thin films and their evolution with thermal annealing Thin nanocrystalline hcp Co-based films are grown by chemical vapor deposition on SiO 2 . Tetrakis͑trimethylphosphine͒cobalt͑0͒, ͑͑CH 3 ͒ 3 P͒ 4 Co, is a single-source precursor that forms Co films that incorporate both P and C when the substrate temperature ranges from 225 to 325°C, and feature crystallites sized Ͻ15 nm. The P within the deposited film is mostly elemental with some being phosphidic, and the C exists mostly in the carbidic form along with some being graphitic. The Co is correspondingly predominantly metallic. Upon annealing to 400°C for 3 h, some extent of both Co 2 P crystallite precipitation and minimal allotropic transformation to fcc Co is observed, and the amount of carbidic C is reduced relative to graphitic C, but the nanocrystalline microstructure of the film is preserved, still primarily composed of hcp Co-based crystallites.

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Effect of pH, Surfactant, and Heat Treatment on Morphology, Structure, and Hardness of Electrodeposited Co-P Coatings

Zeinali-Rad

Allahkaram

Mahdavi

2015

J. of Materi Eng and Perform

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Nano-crystalline and amorphous Co-P coatings were deposited on plain carbon steel substrates by using direct current. Effects of electrolyte pH on morphology, current efficiency, phosphorus content, hardness, and preferred orientation of the nano-crystalline coatings were investigated. Moreover, the effects of heat treatment on microstructure and hardness of the nano-crystalline and the amorphous coatings were studied. The results showed that, phosphorus content and hardness of the nano-crystalline coatings were decreased by increasing of the pH, in spite of a current efficiency enhancement to as much as 98%. Grain size and preferred orientation were also changed from 13 to 31 nm and from mostly [002] to [100] by increasing the pH from 1 to 4, respectively. Smoother coatings and higher current efficiencies were obtained by the addition of 1 g/L sodium dodecyl sulfate (SDS) to the bath. Highest hardness of the nano-crystalline and the amorphous coatings was about 600 and 750 HV, which increased and reached 760 and 1090 HV after heat treatment, respectively.

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Effect of NaCl concentration in electrodeposited Co–P alloy thin films

Cited by 5 publications

References 25 publications

Synthesis of Dilute Phosphorous-Embedded Co Alloy Films on a NiSi Substrate with a Superior Gap-Filling Capability for Nanoscale Interconnects

Synthesis of Dilute Phosphorous-Embedded Co Alloy Films on a NiSi Substrate with a Superior Gap-Filling Capability for Nanoscale Interconnects

Nanocrystalline cobalt-based films with high thermal stability from a single molecule

Effect of pH, Surfactant, and Heat Treatment on Morphology, Structure, and Hardness of Electrodeposited Co-P Coatings

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