2014
DOI: 10.1140/epjp/i2014-14080-8
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Effect of N2/Ar on structure and hardness of TaN-Ag thin films deposited by DC cylindrical magnetron sputtering

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Cited by 3 publications
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“…Many investigations have been carried out in order to catch this aim. The influences of coating temperature, 30 gas pressure, [31][32][33] bias voltage, 34 sputtering power, [35][36][37] and the ratio of nitrogen pressure to argon pressure [38][39][40][41] have been studied in various studies. Despite the fact that the influence of nitrogen on the TaN layer has been studied in a few papers, the influence arising from the ratio of N 2 pressure to argon pressure (P N2 /P Ar ) on corrosion behavior has not been investigated yet.…”
Section: Introductionmentioning
confidence: 99%
“…Many investigations have been carried out in order to catch this aim. The influences of coating temperature, 30 gas pressure, [31][32][33] bias voltage, 34 sputtering power, [35][36][37] and the ratio of nitrogen pressure to argon pressure [38][39][40][41] have been studied in various studies. Despite the fact that the influence of nitrogen on the TaN layer has been studied in a few papers, the influence arising from the ratio of N 2 pressure to argon pressure (P N2 /P Ar ) on corrosion behavior has not been investigated yet.…”
Section: Introductionmentioning
confidence: 99%