2007
DOI: 10.1007/s00339-007-4324-y
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Effect of N2 ambient annealing on the field emission properties of HfNxOy thin films

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Cited by 3 publications
(3 citation statements)
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“…12,13 Among them, hafnium oxynitride film has become one of the most fascinating films due to their peculiarly multifunctional properties. [14][15][16][17][18][19][20][21] Various processes including reactive magnetron sputtering, 15,22 ion beam assisted deposition 18 and chemical vapour deposition 16 have been adopted to prepare hafnium oxynitride films. One of the most important and promising applications is the super mechanical properties of oxynitride films, which closely dependent on nitrogen content.…”
Section: Introductionmentioning
confidence: 99%
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“…12,13 Among them, hafnium oxynitride film has become one of the most fascinating films due to their peculiarly multifunctional properties. [14][15][16][17][18][19][20][21] Various processes including reactive magnetron sputtering, 15,22 ion beam assisted deposition 18 and chemical vapour deposition 16 have been adopted to prepare hafnium oxynitride films. One of the most important and promising applications is the super mechanical properties of oxynitride films, which closely dependent on nitrogen content.…”
Section: Introductionmentioning
confidence: 99%
“…12,13 Among them, hafnium oxynitride film has become one of the most fascinating films due to their peculiarly multifunctional properties. 14-21…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation