Effect of Modulation Period on the Thermally-Induced Solid-State Reactions in Ni/Ti Thin Films
I. O. Kruhlov,
N. V. Franchik,
S. M. Voloshko
et al.
Abstract:In this work, we have studied the structure evolution of Ni/Ti layered stacks with a modulation period of 30 nm and 15 nm (total thickness of the stack is of 60 nm) deposited by RF magnetron sputtering onto p-Si (001) substrate upon vacuum annealing up to 700°C. As found based on the XRD, SIMS and four-point probe resistivity measurements' data, the diffusion-induced reactions in both stacks occur through the stages of metals' intermixing, amorphization and formation of intermetallic NixTi phases. The applicat… Show more
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