2007
DOI: 10.1016/j.jcrysgro.2006.11.011
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Effect of middle temperature intermediate layer on crystal quality of AlGaN grown on sapphire substrates by metalorganic chemical vapor deposition

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Cited by 7 publications
(6 citation statements)
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“…To address those issues, several techniques are currently being pursued, including epitaxial lateral overgrowth [6] , alternate gas feeding in growth process [7] , and the introduction of AlN/AlGaN superlattices (SLs) as an interlayer [8][9][10] . AlN/AlGaN SLs partly relieves the lattice mismatch between AlGaN and AlN/sapphire templates, reducing the driving force of generating dislocations [11] . It also modulates stress and makes dislocations bend or annihilate at SLs interfaces [12] .…”
Section: Introductionmentioning
confidence: 99%
“…To address those issues, several techniques are currently being pursued, including epitaxial lateral overgrowth [6] , alternate gas feeding in growth process [7] , and the introduction of AlN/AlGaN superlattices (SLs) as an interlayer [8][9][10] . AlN/AlGaN SLs partly relieves the lattice mismatch between AlGaN and AlN/sapphire templates, reducing the driving force of generating dislocations [11] . It also modulates stress and makes dislocations bend or annihilate at SLs interfaces [12] .…”
Section: Introductionmentioning
confidence: 99%
“…Meanwhile, AlGaN epitaxy requires temperatures in excess of 1300 °C. The large thermal expansion mismatch in the AlGaN/AlN/sapphire structure results in heat-induced stress, which is released by dislocations 89 , 91 93 . Additionally, because the surface adhesion coefficient of Al atoms is much higher than that of Ga atoms, dense islands tend to form during nucleation growth.…”
Section: Epitaxial Growth and Doping Of Alganmentioning
confidence: 99%
“…In general, the Al composition of Al x Ga 1−x N must be over 40% to effectively fabricate DUV PDs, whereas the decisive difficulty in epitaxially growing high-Al-content AlGaN with high crystalline quality remains challenging, which is ascribed to structural defects derived from the lattice mismatch and thermal expansion mismatch in the epitaxial structure. 18,19 Ga 2 O 3 has been emerging as one of the most promising candidates for DUV PDs owing to its naturally ultrawide bandgap with a cut-off wavelength below 280 nm. 4,[20][21][22] Benefiting from the similar electronic configuration between Ga and Al atoms and the much larger bandgap of Al 2 O 3 , it is feasible to prepare (Al x Ga 1−x ) 2 O 3 alloys with bandgaps modulated from 4.9 to 8.8 eV.…”
Section: Introductionmentioning
confidence: 99%