2015
DOI: 10.1115/1.4031837
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Effect of Microstructure on Electromigration-Induced Stress

Abstract: In this paper, a finite element based simulation approach for predicting the effect of microstructure on the stresses resulting from electromigration-induced diffusion is described. The electromigration and stress-driven diffusion equation is solved coupled to the mechanical equilibrium and elastic constitutive equation, where a diffusional inelastic strain is introduced. Here, the focus is on the steady state, infinite life case, when the current-driven diffusion is balanced by the resulting stress gradient. … Show more

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Cited by 9 publications
(2 citation statements)
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“…Except above mentioned works, there are many papers with detailed numerical analysis and results, but some of the coupling terms in those governing equations are missing in one way or another. [17][18][19][20][21][22][23][24]. Until recently, a general coupling theory for electromigration has been developed, in which all important physical fields and its effects on electromigration are considered and fully coupled.…”
Section: Introductionmentioning
confidence: 99%
“…Except above mentioned works, there are many papers with detailed numerical analysis and results, but some of the coupling terms in those governing equations are missing in one way or another. [17][18][19][20][21][22][23][24]. Until recently, a general coupling theory for electromigration has been developed, in which all important physical fields and its effects on electromigration are considered and fully coupled.…”
Section: Introductionmentioning
confidence: 99%
“…Since solders usually form one or a few large grains, the microstructure of the solder plays an important role in the electromigration induced degradation. In particular, the effect of Sn grain orientation on electromigration induced failure is a very important issue in flip-chip solder joints [7][8]. Lu et al [9] proposed two EM degradation modes in high Sn-based Pb-free solder joints that are associated with different diffusion process.…”
Section: Introductionmentioning
confidence: 99%