Abstract:An experimental and numerical investigation of the effect of material anisotropy on the self-positioning of epitaxial nanostructures has been performed. The self-positioning occurs due to a lattice mismatch between two epitaxial material layers (GaAs and In(0.2)Ga(0.8)As) of a hinge. Both materials have cubic crystal symmetry and possess anisotropic mechanical properties. The dependence of the hinge curvature radius on the material orientation angle was obtained experimentally by creating self-positioning hing… Show more
“…For varying orientation angles, the ratio of maximum and minimum values of the curvature radius is about 1.35. This ratio is similar to experimental data and numerical finite element modeling of GaAs and In 0.2 Ga 0.8 As bi-layer structures [12]. Dependency of the curvature radius on the material orientation angle is close to sinusoidal function with frequency π.…”
Section: Effect Of Materials Anisotropysupporting
confidence: 86%
“…It is assumed that rotations and translations are large but strains are small. Our algorithm [12] includes both material anisotropy and large displacements. Usually, geometrical nonlinearity and anisotropy are treated separately [13,14].…”
Section: Finite Element Analysis 31 Finite Element Algorithm For Animentioning
confidence: 99%
“…Here we investigate effect of material anisotropy on the curvature radius of selfpositioning structures and compare results with experimental data [12]. The hinged A three-dimensional mesh for the symmetrical half of the structure consists of 555 hexahedral 20-node elements and 3125 nodes.…”
This article presents investigations of self-positioning microstructures and nanostructures by analytical techniques, finite element analysis and atomic-scale modeling. Closed-form solutions for curvature radius of self-positioning hinge structures are obtained for plane strain and generalized plane strain deformation. The finite element method is used for predicting hinge curvature radius for self-positioning structures of variable width. Anisotropic finite element analysis of self-positioning structures with different orientation of material axes is performed to estimate the effect of material anisotropy on the self-positioning. An algorithm of the atomic-scale finite element method (AFEM) based on the Tersoff interatomic potential has been developed. The AFEM is applied to modeling of GaAs and InAs bi-layer self-positioning nanostructures. Nanohinge curvature radius dependence on the structure thickness and the material orientation angle is investigated. It was found that atomic-scale effects play considerable role for nanostructures of small thickness less than 40 nm.
“…For varying orientation angles, the ratio of maximum and minimum values of the curvature radius is about 1.35. This ratio is similar to experimental data and numerical finite element modeling of GaAs and In 0.2 Ga 0.8 As bi-layer structures [12]. Dependency of the curvature radius on the material orientation angle is close to sinusoidal function with frequency π.…”
Section: Effect Of Materials Anisotropysupporting
confidence: 86%
“…It is assumed that rotations and translations are large but strains are small. Our algorithm [12] includes both material anisotropy and large displacements. Usually, geometrical nonlinearity and anisotropy are treated separately [13,14].…”
Section: Finite Element Analysis 31 Finite Element Algorithm For Animentioning
confidence: 99%
“…Here we investigate effect of material anisotropy on the curvature radius of selfpositioning structures and compare results with experimental data [12]. The hinged A three-dimensional mesh for the symmetrical half of the structure consists of 555 hexahedral 20-node elements and 3125 nodes.…”
This article presents investigations of self-positioning microstructures and nanostructures by analytical techniques, finite element analysis and atomic-scale modeling. Closed-form solutions for curvature radius of self-positioning hinge structures are obtained for plane strain and generalized plane strain deformation. The finite element method is used for predicting hinge curvature radius for self-positioning structures of variable width. Anisotropic finite element analysis of self-positioning structures with different orientation of material axes is performed to estimate the effect of material anisotropy on the self-positioning. An algorithm of the atomic-scale finite element method (AFEM) based on the Tersoff interatomic potential has been developed. The AFEM is applied to modeling of GaAs and InAs bi-layer self-positioning nanostructures. Nanohinge curvature radius dependence on the structure thickness and the material orientation angle is investigated. It was found that atomic-scale effects play considerable role for nanostructures of small thickness less than 40 nm.
“…In this section, the obtained analytical generalized plane strain solution is compared with the ordinary plane strain solution [15] and with results obtained by the finite element analysis. Details about finite element procedures for self-positioning micro-and nano-structure can be found in publications of Nikishkov et al [17,18]. For comparison of results, we model a bilayer structure as shown in Fig.…”
Section: Comparison Of Analytical and Numerical Solutionsmentioning
A closed-form solution for multilayer structures with initial strains under generalized plane strain conditions is presented. Such solutions can be useful for estimating the curvature radius and strains or stresses for self-positioning micro-and nano-structures with lattice mismatched layers. Comparison with finite element results shows that the developed solution predicts reasonable values of the curvature radius at the central part of the structure. Strains provided by the generalized plane strain solution are in agreement with those obtained by finite element analysis.
“…Analytical solutions have been derived based on continuum mechanics theory to predict the curvature radius [10][11][12]. Computational modeling has been also performed to understand characteristics of self-positioning nanostructures [13][14][15][16]. However, just few publications investigate selfpositioning structures taking into account atomic-scale effects.…”
We performed an atomic-scale analysis of self-positioning nanostructures using the atomic-scale finite element method (AFEM) and Kriging interpolation technique. Equilibrium atomic configurations are determined for varying structure thicknesses and results are compared with the continuum mechanics solution under plane strain conditions. We observed significant decrease of the equilibrium curvature radius when the structure thickness is less than 40 nm. It is found that large compressive strains near the free surface affect the distribution of strains as the structure size decreases.
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