Effect of Magnetron Sputtering Power on ITO Film Deposition at Room Temperature
A. V. Saenko,
Z. E. Vakulov,
V. S. Klimin
et al.
Abstract:Magnetron sputtering in the medium frequency (MF) mode was used to obtain ITO films on glass substrates at room temperature in an oxygen-free environment. The effect of the magnetron sputtering power on the electrophysical properties and surface morphology of ITO films is studied. It is shown that the ITO film deposition rate depends linearly on the power of magnetron sputtering in the MF mode. It is found that ITO films have a predominantly nanocrystalline structure at a magnetron sputtering power of more tha… Show more
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