Abstract:The effect of layout variation on stress migration (SM) in Cu damascene interconnects was investigated in detail. In an extrusion pattern in which narrow lines are connected to a wide line, the failure rate decreases as the narrow line becomes longer and wider. It was found that there is a maximum failure rate between 150 and 200 °C for all test patterns. The results for the SM failure rate showed that the initial rate of increase of SM failure for the extrusion pattern is much larger than that for the convent… Show more
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