1981
DOI: 10.1016/0038-1101(81)90172-6
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Effect of junction depth on the performance of a diffused n+p silicon solar cell

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1983
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Cited by 11 publications
(3 citation statements)
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“…In summary, the efficiency decreased from 23.8% to about 19.9% with the increase in junction depth from 0.1 µm to 2.1 µm because of lower electron-hole pair generation. In previous work, it was shown that the efficiency decreased from 16.4% to 10.35% for junction depth of 0.1 µm and 2 µm, respectively [23].…”
Section: The Effect Of Junction Depthmentioning
confidence: 90%
“…In summary, the efficiency decreased from 23.8% to about 19.9% with the increase in junction depth from 0.1 µm to 2.1 µm because of lower electron-hole pair generation. In previous work, it was shown that the efficiency decreased from 16.4% to 10.35% for junction depth of 0.1 µm and 2 µm, respectively [23].…”
Section: The Effect Of Junction Depthmentioning
confidence: 90%
“…This study deals with the optimization of the thickness of the base of an (n + /p/p + ) silicon solar cell [11]- [18] under monochromatic illumination [19] [20] in frequency modulation [21]- [27] performed under the conditions of applied magnetic field [24] and temperature [28] [29] [30] [31] [32].…”
Section: Introductionmentioning
confidence: 99%
“…1) The theoretical 1D or 3D study model (crystallography, grain size and thickness of different regions) [8] [9] [10].…”
Section: Introductionmentioning
confidence: 99%