2011
DOI: 10.1016/j.jcrysgro.2011.03.024
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Effect of initial substrate conditions on growth of cubic silicon carbide

Abstract: Abstract. In order to analyze the epitaxial growth of cubic silicon carbide by sublimation epitaxy on different substrates, four different 6H-SiC substrates preparations were used: (i) as-received, (ii) repolished, (iii) annealed and covered by silicon layer, (iv) with (111) 3C-SiC buffer layer. Almost 100% coverage and low twin density was achieved when growing on the buffer layer. The XRD and TEM characterizations show better material quality when layer is grown directly on 6H-SiC substrates.Background dopin… Show more

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Cited by 28 publications
(27 citation statements)
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References 28 publications
(29 reference statements)
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“…In thick (100-250 μm) 3C-SiC layers grown on Si-face we typically observe very similar region (around 2x4 mm 2 ) having a low density of TBs while in the vicinity of the good region density of TBs was much higher. This was not a single result, as similar regions were also observed earlier when growing 3C-SiC on the Si-face [10]. Thus it seems that on the Si-face the domain was formed at the beginning of growth at a low temperature, when supersaturation ratio was quite low, and with continued growth the primary 3C-SiC island has extended.…”
Section: Growth Of Cubic Sicsupporting
confidence: 49%
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“…In thick (100-250 μm) 3C-SiC layers grown on Si-face we typically observe very similar region (around 2x4 mm 2 ) having a low density of TBs while in the vicinity of the good region density of TBs was much higher. This was not a single result, as similar regions were also observed earlier when growing 3C-SiC on the Si-face [10]. Thus it seems that on the Si-face the domain was formed at the beginning of growth at a low temperature, when supersaturation ratio was quite low, and with continued growth the primary 3C-SiC island has extended.…”
Section: Growth Of Cubic Sicsupporting
confidence: 49%
“…1) which are caused by stacking faults reaching the surface [10]. In contrast to TBs, SFs density on the surface of the grown material was very similar on both faces (~10 2 -10 3 cm -1 ).…”
Section: Growth Of Cubic Sicmentioning
confidence: 87%
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“…Growth of bulk-like 3C-SiC (111) was performed by sublimation epitaxy [7]. Two samples were grown on large area (quarters of two inch) (0001) silicon face 6H-SiC substrates.…”
Section: Methodsmentioning
confidence: 99%
“…The 3C-SiC(111) was grown by sublimation on 6H-SiC(0001) 17 and it was chemical mechanical polished by NovaSiC. The thickness of graphene was determined by LEEM to be between 2 and 7 monolayers (MLs).…”
mentioning
confidence: 99%