Effect of In2O3 Dopant on the Properties of V2O5 Thin Films Prepared by Vacuum Deposition on ITO Substrates

Abstract

I. INTRODUCTIONThe ambition of the present investigation is the search for new phases showing properties of intellectual and eventual practical interest. Among the various metal oxides the promising candidate, which possesses an interesting catalytic properties of divalent metal vanadates (V) [1,2], including cobalt (II) vanadates (V) [3,4] have been recognized for many years. The variety of vanadium oxidation states ranging from 2+to5+, wide band gap, good thermal, chemical stability and also the unevenness of oxygen coordination geometry causes the two phases such as magnolia (V n O 2n-1 ) and Wadsley (V 2n O 5n-2 ) helps to improve the performance of V 2 O 5 cathode in lithium ion batteries [5,6,7]. The most stable form of the V-O system in the V 2 O 5 was constructed the orthorhombic unit cell structure and also it shows a good resistive property to corrosion because of formation of a surface oxide film, hence it is not affected by water, air, acids at room temperature [8,9]. Even though V 2 O 5 system acquires all supporting qualities of the survival, the modest electronic conductivity is challenging one of the good electrodes [10, 11,12]. Recently, indium oxide promoted vanadium pentoxide has been applied for various purposes, such as photo electrode conductive thin films. In the present investigation provides basic insights of V 2 O 5 -In 2 O 3 based upon their significance in the field energy storage as a primary concern. Amidst of various deposition techniques for film growth, the vacuum evaporation method which yields a high homogeneity surface and controls the deposition parameters gains attention [13][14][15][16]. Hence, this work focused to prepare the thin film for cathode application through the vacuum evaporation method and also it portrays structural, morphological and optical properties of the prepared film.II. EXPERIMENTAL DETAILS V 2 O 5 powder (99.999% source powder purchased from Aldrich) were thermally deposited on the chemically cleaned ITO glass substrates in a vacuum of around 5.5x10-5 Torr using a HIND HIVAC coating unit (Model no. 12A4D). The size of substrates was