Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process

Choudhury, Arup; Barve, S.A.; Chutia, Joyanti; Kakati, H.; Pal, Arup R.; Jagannath,; Mithal, N.; Kishore, R.; Pandey, M.; Patil, D.S.

doi:10.1016/j.tsf.2011.05.079

Cited by 13 publications

(5 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The roughness induced by plasma treatment was higher for O 2 plasma treated samples than for Ar plasma treated ones. This phenomenon was already described in the literature as due to the presence of highly reactive oxygen species in higher amount for O 2 plasma treated samples, which are key players in the surface etching and improvement of the surface hydrophilicity. Moreover, Arik et al showed, in the case of the plasma treatment of PVA/PAA nanofibers, a prevention of bacterial adhesion and growth due to the hydrophilicity enhancement after plasma treatment .…”

Section: Cold Plasma Treatment Of Electrospun Nanofibersmentioning

confidence: 68%

Effect of Cold Plasma Treatment on Electrospun Nanofibers Properties: A Review

Dufay

Jimenez

Degoutin

2020

ACS Appl. Bio Mater.

View full text Add to dashboard Cite

Electrospinning of polymer materials is a widely used technique, providing nanofibrous mats with high surface to volume ratio and porosity, which show a great interest in many fields such as biomedical applications. However, nanofibers generally present some weakness including low mechanical resistance, poor bioactivity, or lower biocompatibility. Among the surface modification techniques described in the literature, cold plasma treatment may prevent these drawbacks and especially improve properties of electrospun nanofibers. Therefore, this review lays out the state-of-the-art of cold plasma treatment of nanofibers and, especially, its effect on the biocompatibility improvement, the immobilization/adsorption of molecules of interest, the surface grafting/cross-linking, and the use of the modified nanofibers in biomedical applications. In particular, this literature review demonstrates the positive effect of cold plasma treatment onto the mechanical, biological, or chemical properties of nanofibers. Future investigations should go further on the effects of the gas type but also on the possibility of coupling cold plasma treatment with other surface modification techniques.

show abstract

Section: Cold Plasma Treatment Of Electrospun Nanofibersmentioning

confidence: 68%

Effect of Cold Plasma Treatment on Electrospun Nanofibers Properties: A Review

Dufay

Jimenez

Degoutin

2020

ACS Appl. Bio Mater.

View full text Add to dashboard Cite

show abstract

“…The Si2p XPS spectra (energy range, 114–94 eV) of films were measured and deconvoluted, as shown in Figure 6. These spectra reveal the contributions of SiO 2 (102.1 eV), Si–O 3 (102.8 eV), Si–O 4 (103.4 eV), and Si–OH (104.3 eV) groups to the organosilicon thin films 32–35 . With the addition of nitrogen gas into the cyclonic APP deposition, the composition of the Si‐O 4 (103.4 eV) group increased.…”

Section: Resultsmentioning

confidence: 98%

Comparative investigation on organosilicon film growth by cyclonic plasma using hexamethyldisilazane and hexamethyldisilazane/nitrogen gas mixture

Wu,

Wang,

et al. 2023

Surface & Interface Analysis

View full text Add to dashboard Cite

This study aimed to discover the surface characteristics of cyclonic plasma‐deposited films and the effect of nitrogen gas addition. The influence of nitrogen gas addition on the surface characteristics of organosilicon films in hexamethyldisilazane (HMDSN) and HMDSN/nitrogen (HMDSN/N2) cyclonic plasmas at atmospheric pressure was evaluated. It was found that the addition of nitrogen gas is a crucial factor affecting organosilicon film growth in the plasma cyclone in one atmosphere. SEM, AFM, and ATR‐FTIR results indicated that on adding nitrogen gas, the surface morphology became rougher, the peak corresponding to the Si–O–Si group was detected at approximately 1050 cm−1, the degree of porosity was relatively low, and the proportion of the SiCHx group decreased. In general, the surface energies of the films deposited in the HMDSN discharge and the HMDSN/N2 gas mixture discharge exhibited similar features. SEM and AFM evaluations showed high roughness values of 44.5 nm for the film formation in the HMDSN/N2 gas mixture discharge, while the films grown in the HMDSN discharge exhibited a relatively flat surface with a roughness of 24.5 nm. Based on ATR‐FTIR detection, cyclonic plasma‐deposited films deposited in the HMDSN discharge obtained organic moieties, while the films generated in the HMDSN/N2 gas mixture discharge exhibited strong Si–O–Si absorption signals. A possible nano‐organosilicon film growth that prevails in atmospheric pressure plasma deposition is proposed based on atmospheric‐pressure plasma chemistry, nitrogen gas addition, and experimental observations.

show abstract

“…The Si 2p peak has been fitted with four peaks corresponding to (CH 3 ) 2 SiO 2 (102.1 eV), Si(CH 3 ) 4 (100.9 eV), (CH 3 ) 3 SiO (101.5 eV), and SiO 4 (103.4 eV). [30][31][32] The HMDSO plasma-jet-deposited films have a high proportion of (CH 3 ) 2 SiO 2 units, suggesting that the chemical structure is relatively unlike that of a linear organosilicon polymer. This implies that the HMDSO monomer rapidly penetrates the plasma jet and may dissociated by electron impact and Penning dissociation.…”

Section: Resultsmentioning

confidence: 99%

Surface characterization of organosilicon films by low-temperature atmospheric-pressure plasma jet

Wu¹,

Tseng²,

Li³

et al. 2017

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

A new plasma discharge jet was created to carry out the vacuum-free formation of organosilicon thin films at atmospheric pressure. The properties of the plasma-jet-deposited organosilicon film surfaces were evaluated for different plasma powers by contact-angle, scanning electron microscope (SEM), atomic force microscope (AFM), and X-ray photoelectron spectroscopy (XPS) analyses. The surface analysis indicates that the plasma power is the main factor affecting film growth by plasma chemical vapor deposition at atmospheric pressure. Analysis of the surface morphology by SEM and AFM indicates that smooth and uniform organosilicon thin films can be synthesized at a relatively low plasma power. Chemical detection by XPS is used to examine the mainly inorganic characteristics of the plasma-jet-deposited organosilicon films. The results of this investigation demonstrate the possibility of growing vacuum-free plasma-deposited films for large-area processing.

show abstract

Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process

Cited by 13 publications

References 24 publications

Effect of Cold Plasma Treatment on Electrospun Nanofibers Properties: A Review

Effect of Cold Plasma Treatment on Electrospun Nanofibers Properties: A Review

Comparative investigation on organosilicon film growth by cyclonic plasma using hexamethyldisilazane and hexamethyldisilazane/nitrogen gas mixture

Surface characterization of organosilicon films by low-temperature atmospheric-pressure plasma jet

Contact Info

Product

Resources

About