1997
DOI: 10.1002/1521-396x(199705)161:1<143::aid-pssa143>3.0.co;2-a
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Effect of Hydrostatic Pressure on the Resistivity of n- and p-Type Polycrystalline InSb Thin Films

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“…Metallic films on glass substrates are grown by thermal evaporation, whereas the semiconducting InSb films are deposited by flash evaporation [9]. Polycrystalline gold films could be obtained with a surface roughness of less than 0.8 nm.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Metallic films on glass substrates are grown by thermal evaporation, whereas the semiconducting InSb films are deposited by flash evaporation [9]. Polycrystalline gold films could be obtained with a surface roughness of less than 0.8 nm.…”
Section: Methodsmentioning
confidence: 99%
“…Thus the surface roughness varies between 10 nm and 70 nm. At low substrate temperatures flatter films can be obtained [9]. In this contribution only results of smooth films with approximately 10 nm surface roughness are presented.…”
Section: Methodsmentioning
confidence: 99%