“…Various deposition systems have been employed for the deposition of AZO films including a sol-gel process, radio frequency (RF)magnetron sputtering, pulsed laser deposition, and electron beam evaporation [14][15][16][17][18][19]. Among them, RF-magnetron sputtering is a popular choice due to its low cost, simplicity, capability to deposit highly crystalline films that are uniform, dense, and strongly adherent, and low operating temperature [20,21]. However, achieving a high figure of merit in AZO films at ambient temperature, which could circumvent degradation of the sensitive photoresist or plastic substrates used in opto-electric devices (e.g., LEDs), remains a challenge.…”