Effect of high entropy alloys TiVCrZrHf barrier layer on microstructure and texture of Cu thin films

Peng, Xiao; Chen, Leng

doi:10.1016/j.matlet.2018.07.080

Cited by 16 publications

(2 citation statements)

References 22 publications

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“…All the cross-section morphologies are typical dense columnar structures, as shown in Figure 7 a–d. The grain sizes of the different components obtained in Table 6 according to the Scherrer equation:

where k is the shape factor ( k = 0.943 [ 43 ]),

is the full width at half-maximum. The grain size of the ZrMoTaW film is between 10 nm and 15 nm.…”

Section: Resultsmentioning

confidence: 99%

High-Throughput Preparation and Characterization of ZrMoTaW Refractory Multi-Principal Element Alloy Film

et al. 2022

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In this work, high-throughput screening technology is applied to four-member refractory multi-principal element alloys (RMPEAs) films with high W content. The exploration of refractory metals such as W is strictly limited by the high melting temperature in this work; a multi-gradient deposition method was introduced to overcome this obstacle. By adjusting the power and distance from the target to the sample, component Zr11Mo11Ta25W53 with the best hardening performance was successfully obtained. The uniformity of the material library was analyzed from the perspectives of phase structure and micromorphology. With the help of Hume-Rothery theory and XRD analysis, it is shown that the film has a stable bcc structure. It is believed that film uniformity, nanoscale size, preferential orientation, surface roughness, and solution mechanism are the pivotal factors to improve hardness performance, especially for high W components. The hardness and modulus of elasticity can reach 20 GPa and 300 GPa, respectively, and the H/Er and H3/Er2 values are 0.067 and 0.065, showing the best wear resistance in many samples.

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where k is the shape factor ( k = 0.943 [ 43 ]),

is the full width at half-maximum. The grain size of the ZrMoTaW film is between 10 nm and 15 nm.…”

Section: Resultsmentioning

confidence: 99%

High-Throughput Preparation and Characterization of ZrMoTaW Refractory Multi-Principal Element Alloy Film

et al. 2022

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“…A barrier material is needed to improve the reliability and the stability of such material. Peng et al [103] studied a TiVCrZrHf HEF deposited by magnetron sputtering on Si/SiO 2 as a barrier layer for copper. The results revealed that HEF retarded the diffusion of copper at temperatures below 600 • C. A failure was observed at 700 • C, since TiVCrZrHf crystallized and an interdiffusion between the coating and copper occurred.…”

Section: Diffusion Barrier Applicationmentioning

confidence: 99%

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

2022

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High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation. Recently, the scientific community has seen an increasing development of the multicomponent coatings, improving their properties compared to conventional films. Technically, different strategies have been exploited to fabricate HEFs. Magnetron-sputtered HEFs have made significant advancements in this field. HEFs have various applications given their interesting performances. This article overviews the development and the outcome of HEFs prepared using the magnetron sputtering technique. The classification of HEFs is reported. The effect of magnetron sputtering parameters on the microstructural, mechanical, electrochemical and thermal properties of HEFs is also discussed. Applications of HEFs are reported in the last section.

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High-Entropy Coatings

Chen

2021

High-Entropy Materials: Theory, Experiments, and Applications

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Effect of high entropy alloys TiVCrZrHf barrier layer on microstructure and texture of Cu thin films

Cited by 16 publications

References 22 publications

High-Throughput Preparation and Characterization of ZrMoTaW Refractory Multi-Principal Element Alloy Film

High-Throughput Preparation and Characterization of ZrMoTaW Refractory Multi-Principal Element Alloy Film

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

High-Entropy Coatings

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