2014
DOI: 10.1134/s0036023614050192
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Effect of heterovalent substitution on the electrical and optical properties of ZnO(M) thin films (M = Ga, In)

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Cited by 4 publications
(6 citation statements)
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“…Al 3+ and Mg 2+ doping leads to a strong decrease of this low-temperature reduction peak and of the EPR resonance signal around 2.04. This might then correspond to fewer oxygen defects present in ZnO:Al and ZnO:Mg. Likely, the “hardness” of the smaller and highly charged cations Al 3+ and Mg 2+ leads to a stronger binding of lattice oxygen and thus prevents the formation of oxygen vacancies . The different behaviors of Al 3+ and Ga 3+ dopants, despite their similar valence electron configurations, could be explained by the difference in polarizability and ionic radii of the dopants, properties in which Ga 3+ is much more similar to Zn 2+ in comparison to Al 3+ .…”
Section: Resultsmentioning
confidence: 99%
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“…Al 3+ and Mg 2+ doping leads to a strong decrease of this low-temperature reduction peak and of the EPR resonance signal around 2.04. This might then correspond to fewer oxygen defects present in ZnO:Al and ZnO:Mg. Likely, the “hardness” of the smaller and highly charged cations Al 3+ and Mg 2+ leads to a stronger binding of lattice oxygen and thus prevents the formation of oxygen vacancies . The different behaviors of Al 3+ and Ga 3+ dopants, despite their similar valence electron configurations, could be explained by the difference in polarizability and ionic radii of the dopants, properties in which Ga 3+ is much more similar to Zn 2+ in comparison to Al 3+ .…”
Section: Resultsmentioning
confidence: 99%
“…9 Ga 3+ on the other hand could be expected to preferentially occupy octahedral sites due to their larger ionic radius. 21,31 This is also supported by the analysis of the ZnO lattice parameters obtained by XRD 21 . Rietveld analysis revealed a higher unit cell volume for ZnO:Ga 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 24 and a slightly smaller volume for ZnO:Al (see Table S1 in the Supporting Information) supporting the assumption that Al 3+ occupies substitutional sites and Ga 3+ preferentially octahedral interstitials.…”
Section: Acs Catalysismentioning
confidence: 97%
“…In the case of samples A1, characteristic In 2 O 3 peak of (222) appeared prominent but for ZnO, the characteristic and minor peaks remained diminished. That could be because of the difference in ionic radii of In 3+ (0.094 nm) and Zn 2+ (0.074 nm) and precursor composition [43]. In the case of D1 thin films deposited from Ga: Zn 1:9 oxide source solutions' mixing ratio, characteristic ZnO major and minor peaks appeared as observed in the study of Al Dahoudi [39].…”
Section: Xrd Structural Analysismentioning
confidence: 88%
“…In the case of D1 thin films, wherein almost equal ionic radii of Zn 2+ and Ga 3+ competed for crystal growth resulting in further reduced crystallinity and increased scattering reducing carrier mobility and hence electrical conductivity [42]. Highly resistive behavior of C1 thin films (gallium-rich GZO, because of this were not characterized further other than resistivity and not applied in solar cell device) is due to excessive concentration of gallium that leads to a decrease in the degree of crystallinity and conductivity [43], decrease in electron density [47] and suppression of donor oxygen vacancies [48].…”
Section: Hall Effect Electrical Measurementsmentioning
confidence: 99%
“…Coating formation on metal and alloy surfaces is one of the most common ways to protect items from environmental impacts [1][2][3][4] and to specifically func tionalize their surfaces [5][6][7]. Plasma electrolytic oxi dation (PEO) is an outstanding route to form protec tive coatings [see 8-10 and other references].…”
mentioning
confidence: 99%