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2000
DOI: 10.1016/s0022-3093(00)00134-4
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Effect of H2/O2 ratio on the GeO2 concentration profile in SiO2:GeO2 glass preforms prepared by vapor-phase axial deposition

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Cited by 8 publications
(4 citation statements)
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“…7 shows the germanium doping profiles from the lower and upper extremity and the center of the preform. The higher GeO 2 concentration of the outer diameter region in comparison to the center of the preform is due to the deposition of the crystalline phase of GeO 2 induced by a lower temperature of deposition [19], [20]. Dehydration with Cl 2 gas was not considered in these preforms, which explains the effect of noelimination of the GeO 2 crystalline phase [21].…”
Section: Correlation Between Preform Bottom Profile and Germaniumentioning
confidence: 99%
“…7 shows the germanium doping profiles from the lower and upper extremity and the center of the preform. The higher GeO 2 concentration of the outer diameter region in comparison to the center of the preform is due to the deposition of the crystalline phase of GeO 2 induced by a lower temperature of deposition [19], [20]. Dehydration with Cl 2 gas was not considered in these preforms, which explains the effect of noelimination of the GeO 2 crystalline phase [21].…”
Section: Correlation Between Preform Bottom Profile and Germaniumentioning
confidence: 99%
“…Figure a shows a conceptual diagram of the VAD method . As shown in the leftmost schematic, SiCl 4 and GeCl 4 are injected into oxy–hydrogen gas burners, and fine SiO 2 and GeO 2 particles are produced by the flame hydrolysis reaction given below, and are then deposited onto the end surface of the seed SiO 2 glass rod: The seed rod is pulled upward and rotated during chemical deposition, producing a porous preform (middle picture in Figure a). The inner and outer deposited regions of the porous preform become the core (SiO 2 –GeO 2 ) and cladding (SiO 2 ), respectively.…”
mentioning
confidence: 99%
“…1 Figure 1a shows a conceptual diagram of the VAD method. 1 As shown in the leftmost schematic, SiCl 4 and GeCl 4 are injected into oxy−hydrogen gas burners, and fine SiO 2 and GeO 2 particles are produced by the flame hydrolysis reaction 2 given below, and are then deposited onto the end surface of the seed SiO 2 glass rod:…”
mentioning
confidence: 99%
“…A flutuação de concentração é diretamente proporcional à concentração do dopante. Quanto mais redutora for a chama, menor a taxa de deposição de GeO 2 na preforma porosa, Cuevas (2000).…”
Section: Influência Da Razão H 2 /O 2 Em Preforma Porosa Puraunclassified