EFFECT OF Bi SURFACTANT IN THE HETEROEPITAXIAL GROWTH OF Co ON Cu SURFACES

Kamiko, Masao; Chihaya, Hiroaki; Sugimoto, Wataru; Yamamoto, Ryōichi; Oh, Sang-Mun; Xu, Jü; Kojima, Isao

doi:10.1142/s0218625x06008153

Cited by 6 publications

(6 citation statements)

References 21 publications

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“…Several other surfactant elements such as Bi, [26][27][28][29][30] Ag, [31][32][33][34][35] Au 36 and In 37 have been similarly found to induce layer quality improvement for physically deposited multilayers.…”

Section: D332mentioning

confidence: 99%

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Influence of Ag Additive to the Spacer Layer on the Structure and Giant Magnetoresistance of Electrodeposited Co/Cu Multilayers

Neuróhr

Péter

Pogány

et al. 2015

J. Electrochem. Soc.

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In order to explore the possible surfactant effect of Ag on the formation of electrodeposited multilayers, Co/Cu(Ag) multilayers were prepared by this technique and their structure and giant magnetoresistance (GMR) were investigated. The multilayers were deposited from a perchlorate bath with various amounts of Ag + ions in the solution for incorporating Ag atoms into the multilayer stack. Without Ag addition, secondary neutral mass spectroscopy (SNMS) indicated a well-defined composition modulation of the undermost Co/Cu bilayers. However, already at an Ag content as low as 1.8 at.% incorporated, SNMS showed a deterioration of the periodic multilayer structure. In agreement with the SNMS results, superlattice satellites were visible in the X-ray diffraction (XRD) patterns of the multilayers with up to 0.3 at.% Ag. The satellites were, however, very faint even for multilayers without Ag addition, indicating that the multilayers have high interface roughness and/or poor periodicity. In the absence of Ag and at the smallest Ag content investigated by XRD, a strong central multilayer peak and the weak superlattice satellites were complemented by weak diffraction maxima from non-periodic Co and Cu domains. In the Co/Cu(Ag) multilayer containing about 25 at.% Ag, i.e., nearly as much as Cu, XRD found a separate Ag(Cu) phase. In spite of the imperfect layered structure, a multilayer-type GMR behavior was observed in all samples up to about 10 at.% Ag incorporated in the multilayer stack. The GMR magnitude increased for Ag contents up to about 1 at.%, which implies that a small amount of Ag may have a beneficial effect through a slight modification of the layer growth and/or interface formation. However, for higher Ag contents beyond this level, the GMR was reduced in line with the structural degradation revealed by XRD and SNMS. For the highest Ag contents (above about 10 at.%), the GMR exhibited a behavior characteristic of a granular magnetic alloy, in agreement with the results of the structural study. One of the major obstacles hindering the realization of a high giant magnetoresistance (GMR) in electrodeposited (ED) ferromagnetic/non-magnetic (FM/NM) multilayers is that the nonmagnetic spacer layer cannot be electrodeposited as pinhole-free for layer thicknesses which are required to achieve high GMR and an oscillatory GMR behavior. 1 Sputtered Co/Cu multilayers 2-4 exhibit an oscillatory GMR and a room-temperature GMR of about 50% and 20% at about 1 and 2 nm Cu layer thicknesses, respectively. At these particular spacer thicknesses, a strong antiferromagnetic (AF) exchange coupling exists between the adjacent magnetic layers. It gives rise then to a large GMR effect since the AF coupling ensures an antiparallel alignment of the magnetizations of the neighboring magnetic layers in zero magnetic field. For spacer thicknesses between these so-called AF maxima, the exchange coupling is predominantly ferromagnetic. Thus, due to the parallel alignment of the layer magnetizations even in zero magnetic field, no GMR eff...

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Section: D332mentioning

confidence: 99%

“…Further studies [23][24][25][26][27] have also demonstrated the beneficial effect of Pb as surfactant in evaporated and MBE-grown FM/NM multilayers. Several other surfactant elements such as Bi, [26][27][28][29][30] Ag, [31][32][33][34][35] Au 36 and In 37 have been similarly found to induce layer quality improvement for physically deposited multilayers.…”

mentioning

confidence: 99%

Influence of Ag Additive to the Spacer Layer on the Structure and Giant Magnetoresistance of Electrodeposited Co/Cu Multilayers

Neuróhr

Péter

Pogány

et al. 2015

J. Electrochem. Soc.

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“…This indicated that the growth mode as LbL growth (details are shown in Ref. [17]). When Co was deposited on Cu(100) covered with Bi atoms, the number of oscillations was decreased with increasing the deposited amount of Bi.…”

Section: Surfactant-mediated Heteroepitaxial Growth Of Co On the Cu S...mentioning

confidence: 83%

Surfactant-Mediated Epitaxial Growth of Metallic Thin Films

Kamiko

Yamamoto

2010

AMR

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The effects of several surfactants on the homoepitaxial and heteroepitaxial growth of metallic films and multilayers have been studied and compared. Our measurements clearly revealed that pre-deposition of a small amount of surfactant prior to the adatom deposition changed thin film growth mode and structure. The pre-deposited surfactant enhanced layer-by-layer (LBL) growth of the homoepitaxial and heteroepitaxial growth of metallic films. The surfactant also enhanced the epitaxial growth of metallic multilayer.

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“…This indicated that the growth mode as LbL growth (details are shown in Ref. [3]). When Co was deposited on Cu(1 0 0) covered with Bi atoms, the number of oscillations was decreased with increasing the deposited amount of Bi.…”

mentioning

confidence: 83%