2012
DOI: 10.1016/j.matchemphys.2012.01.093
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Effect of flow dynamics on the growth kinetics of CdS thin films in chemical bath deposition

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Cited by 9 publications
(3 citation statements)
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“…This was because the viscosity and density (see Table S4) of the solution decreased with the increase in temperature. With the increase of stirring speed, the Reynolds number increases and the thickness of the diffusion boundary layer (δ) decreases (see Table S5), which means that the diffusion length of dissolved APIs to the seed is reduced, thus increasing the deposition rate . As shown in Figure b, the crystal growth rate of allopurinol at 300 rpm was markedly higher than that at 100 rpm.…”
Section: Resultsmentioning
confidence: 98%
See 1 more Smart Citation
“…This was because the viscosity and density (see Table S4) of the solution decreased with the increase in temperature. With the increase of stirring speed, the Reynolds number increases and the thickness of the diffusion boundary layer (δ) decreases (see Table S5), which means that the diffusion length of dissolved APIs to the seed is reduced, thus increasing the deposition rate . As shown in Figure b, the crystal growth rate of allopurinol at 300 rpm was markedly higher than that at 100 rpm.…”
Section: Resultsmentioning
confidence: 98%
“…With the increase of stirring speed, the Reynolds number increases and the thickness of the diffusion boundary layer (δ) decreases (see Table S5), which means that the diffusion length of dissolved APIs to the seed is reduced, thus increasing the deposition rate. 45 As shown in Figure 4b, the crystal growth rate of allopurinol at 300 rpm was markedly higher than that at 100 rpm. However, as presented in Figure 4a, the stirring speed has only a small influence on the crystal growth kinetics of mesalazine and the crystal growth rate of mesalazine at 300 rpm was slightly higher than that at 100 rpm.…”
Section: Experimental Strategymentioning
confidence: 84%
“…However, several authors have reported explicitly or implicitly that the lower the reaction temperature the lower the thin film growth rate [12,15,20,21,23,28,34,35,54,[77][78][79][80][81]84,87,90,[103][104][105][106][107][108][109][110][111][112][113][114][115][116][117][118][119][120][121]. Thus, without delving into the cases in which homogeneous precipitation is favored, which limits the maximum d-a limit which was directly reported [12,15,21] or simply evident in the results reported [115,118,120] by some authors-the use of low temperatures lengthens the time required to achieve a thin film with determined d compared to the time required at higher temperatures.…”
Section: Selection Of a Convenient Temperaturementioning
confidence: 99%