Double-barrier magnetic tunnel junctions with two MgO barriers and three CoFeB layers exhibiting tunneling magnetoresistance ͑TMR͒ values of more than 100% were fabricated. The bias voltage dependence of the TMR ratio is highly asymmetric after annealing at low temperatures, indicating dissimilar CoFeB / MgO interfaces. The TMR effect decays very slowly for positive bias and is only reduced to half of its maximum value at V 1/2 = 1.88 V when the junctions are processed at 200°C. The largest output voltage, 0.62 V, is obtained after annealing at 300°C, a temperature that combines high TMR ratios with a considerable asymmetric bias dependence. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2362977͔Following the demonstration of large tunneling magnetoresistance ͑TMR͒ ratios and low resistance-area products in magnetic tunnel junctions with a crystalline MgO͑001͒ barrier, MgO is now considered as the key barrier material for next-generation device applications. Giant TMR ratios well above 100% at room temperature have been obtained with epitaxial Fe/ MgO / Fe junctions, 1-5 textured magnetic tunnel junctions ͑MTJs͒, 6 and CoFeB / MgO / CoFeB structures. [7][8][9][10][11] In the latter case, the MgO barrier grows with a highly oriented ͑001͒ texture on top of an amorphous CoFeB layer. A postdeposition annealing process then crystallizes the CoFeB electrodes, thereby creating the different Bloch state symmetries with dissimilar decay rates in the MgO barrier that are necessary for giant TMR values. 12,13 In practical applications, MTJ structures are biased to increase the output voltage and decrease its signal-to-noise ratio. Electronic structure effects, magnon excitations, and spin-flip scattering on interface defects, however, reduce the TMR effect at elevated bias voltage and this limits the output signal of MTJ sensors and memory elements. A possible solution is to use double-barrier magnetic tunnel junctions ͑DMTJs͒ where the applied voltage is divided over two single junctions. Experimental studies on DMTJs with amorphous Al 2 O 3 barriers [14][15][16] and fully epitaxial Fe/ MgO double-barrier structures 17 have indeed confirmed a slower decay of the TMR ratio with bias voltage. In this letter, we demonstrate that high quality double-barrier junctions with crystalline MgO barriers and CoFeB electrodes can be fabricated by magnetron sputtering and postdeposition annealing. The bias voltage dependence of the TMR is asymmetric and depends strongly on the annealing temperature. These results can be used to engineer MTJs with high output signals.The DMTJs consisting of a 5 Ta/50 Ru/5 Ta/5 NiFe/10 IrMn/2 CoFe/0.7 Ru/4 CoFeB/2.5 MgO/3 CoFeB/2.5 MgO/4 CoFeB/0.7 Ru/2 CoFe/10 IrMn/5 NiFe/5 Ta ͑thickness in nanometers͒ multilayer stack were grown by magnetron sputtering on thermally oxidized Si substrates in our Shamrock deposition tool. All metallic layers were deposited by dc sputtering and a Co 40 Fe 40 B 20 ͑at. %͒ alloy target was used for the ferromagnetic electrodes. The MgO barriers were fabricated by rf ...