2017
DOI: 10.1007/s10854-017-6385-9
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Effect of electrodepositing Ag on DC etching aluminum foils for electrolytic capacitor

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Cited by 9 publications
(3 citation statements)
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“…However, little attention was paid to the cubic tunnel model with branches. On another way, we have also found that both Zn and Ag nuclei were deposited on Al foil as pretreatment to induce tunnel etching perpendicular to Al surface (Ban et al, 2013c;Ban et al, 2017). The similar results were further verified by Peng et al who electrodeposited Zn nuclei on Al foil (Peng et al, 2015).…”
Section: Introductionsupporting
confidence: 77%
“…However, little attention was paid to the cubic tunnel model with branches. On another way, we have also found that both Zn and Ag nuclei were deposited on Al foil as pretreatment to induce tunnel etching perpendicular to Al surface (Ban et al, 2013c;Ban et al, 2017). The similar results were further verified by Peng et al who electrodeposited Zn nuclei on Al foil (Peng et al, 2015).…”
Section: Introductionsupporting
confidence: 77%
“…8 Fortunately, we developed a polishing method enables counting the tunnel length. Many scholars have studied the effects of bath temperature, 8-10 current density, [10][11][12] and bath chemistry 3,[13][14][15][16][17] on tunnel growth. These factors have a clear impact on tunnel growth and have guided industrial production.…”
Section: Introductionmentioning
confidence: 99%
“…DC or AC etching is usually considered to be an effective method of increasing the surface area of aluminum foils. The growth of pits using high-purity aluminum during DC etching in hot HCl solutions has been investigated with respect to the effect of electrolyte conditions on the pit shape [1], morphology of the early stages of the pitting corrosion [2], the tunnel pit growth rate [3], the effect of impurities on the DC etching behavior [4,5], the influence on the etch pit width and tunnel length [6], the tunnel growth effect after preprocessing with polymeric corrosion inhibitor before DC etching [7], and other methods assisting DC etching [8].…”
Section: Introductionmentioning
confidence: 99%